Wear-resistant ultraviolet curing silk printing snowflake printing ink
A snowflake ink and ultraviolet light technology, applied in inks, household appliances, applications, etc., can solve the problems of disordered snowflake particle aggregation, insignificant snowflake effect, and unsatisfactory silk-screen snowflake ink adhesion and friction resistance.
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Embodiment 1
[0028] A wear-resistant UV-curable silkscreen snowflake ink, comprising the following components:
[0029] 60 parts of photocurable resin, wherein, photocurable resin is the mixture of aminoacrylic resin and hydroxyl acrylic resin (mass ratio is 1:4);
[0030] 4 parts of photoinitiator, photoinitiator is benzoin;
[0031] 2 parts of photosensitization accelerator, photosensitization accelerator is dimethylaminoethyl methacrylate;
[0032] 10 parts of photosensitive nano silicon dioxide, the surface of the silicon dioxide particles is modified by methacryloxypropyl trimethyloxysilane, the particle diameter of the silicon dioxide particles is 40nm; the surface of the photosensitive nano silicon dioxide Modified bonding ratio is 45;
[0033] 0.3 parts of defoamer, the model of defoamer is X-2080;
[0034] 2 parts of leveling agent, the type of leveling agent is TEGOGlide432;
[0035] 0.1 part of polymerization inhibitor, polymerization inhibitor is hydroquinone;
[0036] 13 ...
Embodiment 2
[0039] A wear-resistant UV-curable silkscreen snowflake ink, comprising the following components:
[0040] 60 parts of photocurable resin, wherein the photocurable resin is a mixture of aminoacrylic resin, epoxy acrylic resin and polyketone resin (mass ratio is 1:2:0.5);
[0041] 3 parts of photoinitiator, photoinitiator is camphorquinone;
[0042] 1 part of photosensitization accelerator, the photosensitization accelerator is dimethylaminoethyl methacrylate;
[0043] 10 parts of photosensitive nano silicon dioxide, the surface of the silicon dioxide particles is modified by methacryloxypropyl trimethyloxysilane, the particle diameter of the silicon dioxide particles is 30nm; the surface of the photosensitive nano silicon dioxide Modified bonding rate is 50;
[0044] 0.3 parts of defoamer, the model of defoamer is X-2080;
[0045] 2 parts of leveling agent, the type of leveling agent is TEGOGlide432;
[0046] 0.1 part of polymerization inhibitor, polymerization inhibitor i...
Embodiment 3
[0050] A wear-resistant UV-curable silkscreen snowflake ink, comprising the following components:
[0051] 63 parts of photocurable resin, wherein the photocurable resin is a mixture of aminoacrylic resin, epoxy acrylic resin and polyaldehyde resin (mass ratio is 1:2:0.4);
[0052] 3 parts of photoinitiator, photoinitiator is camphorquinone;
[0053] 1 part of photosensitization accelerator, the photosensitization accelerator is dimethyl p-toluidine;
[0054] 10 parts of photosensitive nano silicon dioxide, the surface of the silicon dioxide particles is modified by methacryloxypropyl trimethyloxysilane, the particle diameter of the silicon dioxide particles is 35nm; the surface of the photosensitive nano silicon dioxide Modified bonding ratio is 45;
[0055] 0.3 parts of defoamer, the model of defoamer is X-2080;
[0056] 2 parts of leveling agent, the type of leveling agent is TEGOGlide432;
[0057] 0.1 part of polymerization inhibitor, polymerization inhibitor is hydroq...
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