Preparation method of high-dispersibility ITO powder

A high-dispersion, powder technology, applied in chemical instruments and methods, inorganic chemistry, gallium/indium/thallium compounds, etc., can solve the problems of low sintering activity, more agglomeration, and unsatisfactory dispersion of ITO powder, and achieve Good fluidity, less hard agglomeration, good dispersion effect

Active Publication Date: 2017-08-29
ANHUI TUOJITAI NOVEL CERAMIC TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] The invention provides a preparation method of highly dispersible ITO powder, which solves the problems of unsatisfactory dispersibility, frequent agglomeration and low sintering activity of the ITO powder prepared by the existing preparation method

Method used

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  • Preparation method of high-dispersibility ITO powder

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Embodiment 1

[0024] The present embodiment provides a kind of preparation method of highly dispersible ITO powder, comprises the following steps:

[0025] (1) Weigh metal In and add to HNO 3 Completely dissolved in solution, according to In 2 o 3 / SnO 2 The mass ratio is 9:1, weigh SnCl 4 ·5H 2 O white crystals are added in the indium salt solution, stirred evenly to prepare the mixed salt solution;

[0026] (2) Take NH with a pH value of 7 4 AC buffer solution, adding a composite dispersant to the buffer solution; the amount of the composite dispersant added is 4% of the total amount of ITO powder; the composite dispersant is sodium dodecylsulfonate with a mass ratio of 1:2:1 , pregelatinized starch and polyvinylpyrrolidone;

[0027] (3) Add ammonia water and mixed salt solution dropwise to the buffer solution at the same time, and during the dropping process, adjust the drip rate of ammonia water so that the pH value of the solution remains basically unchanged, and generate an ind...

Embodiment 2

[0033] The present embodiment provides a kind of preparation method of highly dispersible ITO powder, comprises the following steps:

[0034] (1) Weigh metal In and add to HNO 3 Completely dissolved in solution, according to In 2 o 3 / SnO 2 The mass ratio is 9:1, weigh SnCl 4 ·5H 2 O white crystals are added in the indium salt solution, stirred evenly to prepare the mixed salt solution;

[0035] (2) Take NH with a pH value of 6 4 AC buffer solution, adding a composite dispersant to the buffer solution; the amount of the composite dispersant added is 2% of the total amount of ITO powder; the composite dispersant is sodium dodecylsulfonate with a mass ratio of 1:2:1 , pregelatinized starch and polyvinylpyrrolidone;

[0036] (3) Add ammonia water and mixed salt solution dropwise to the buffer solution at the same time, and during the dropping process, adjust the drip rate of ammonia water so that the pH value of the solution remains basically unchanged, and generate an ind...

Embodiment 3

[0042] The present embodiment provides a kind of preparation method of highly dispersible ITO powder, comprises the following steps:

[0043] (1) Weigh metal In and add to HNO 3 Completely dissolved in solution, according to In 2 o 3 / SnO 2 The mass ratio is 9:1, weigh SnCl 4 ·5H 2 O white crystals are added in the indium salt solution, stirred evenly to prepare the mixed salt solution;

[0044] (2) Take NH with a pH value of 7 4 AC buffer solution, adding a composite dispersant to the buffer solution; the amount of the composite dispersant added is 5% of the total amount of ITO powder; the composite dispersant is sodium dodecylsulfonate with a mass ratio of 1:2:1 , pregelatinized starch and polyvinylpyrrolidone;

[0045](3) Add ammonia water and mixed salt solution dropwise to the buffer solution at the same time, and during the dropping process, adjust the drip rate of ammonia water so that the pH value of the solution remains basically unchanged, and generate an indi...

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Abstract

The invention discloses a preparation method of high-dispersibility ITO powder and belongs to the technical field of preparation of indium tin oxide composite powder. The method comprises the steps of adding metal In to a HNO3 solution for completely dissolving; weighing SnCl4.5H2O white crystal at the mass ratio of In2O3 to SnO2 being 9:1, adding the SnCl4.5H2O white crystal to an indium salt solution and stirring evenly to prepare a mixed salt solution; adding a composite dispersing agent to a NH4AC buffer solution; dropwise adding ammonia water and a mixed salt solution to the buffer solution at the same time, thereby generating a indium-tin hydroxide precursor; reacting completely, ageing and carrying out suction filtration, washing the obtained indium-tin hydroxide precursor with water and an organic solvent separately; standing the washed indium-tin hydroxide precursor at room temperature and naturally airing; and calcining at a high temperature for 4h to obtain yellow ITO powder. The ITO powder prepared by adopting the preparation method has few hard agglomerates, and is good in mobility and easy to shape by pressing.

Description

technical field [0001] The invention relates to the technical field of preparation of indium tin oxide composite powder, in particular to a method for preparing ITO powder by a co-precipitation method. Background technique [0002] The ITO film can be prepared by the magnetron sputtering method from the ITO target material. In industrial production, the magnetron sputtering method is mostly used to sputter the ITO target material on the glass into a very thin layer of transparent conductive film (thickness is about 100nm). ), etch the film to prepare electrode materials for flat panel displays. ITO powder is the raw material for preparing ITO sputtering coating targets. To obtain high-quality and high-density ITO sputtering targets, it is necessary to have a uniform composition of ultra-pure, ultra-fine and highly sinterable ITO powder. [0003] Generally speaking, the specific requirements for ITO powder are: the particle size is less than 100nm, and the specific surface a...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01G19/02C01G15/00
CPCC01G15/00C01G19/02C01P2004/03C01P2006/11
Inventor 张天舒孔令兵宋晓超何东将卫国
Owner ANHUI TUOJITAI NOVEL CERAMIC TECH
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