A method for fabricating superhydrophobic and anti-reflective surfaces by femtosecond laser without mask

A technology of femtosecond laser and femtosecond laser, which is applied in the direction of manufacturing tools, laser welding equipment, sputtering coating, etc., can solve the problems of high price, poor controllability of the preparation process, and restrictions on the commercial application of superhydrophobic materials. Effects of low and good superhydrophobic and self-cleaning properties

Active Publication Date: 2019-11-12
BEIJING INSTITUTE OF TECHNOLOGYGY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, some of these methods require vacuum equipment in the preparation process, which is expensive, such as electron beam etching and ion beam sputtering; some preparation processes have poor controllability, such as chemical etching, etc.; The preparation of masks and masks is complicated and expensive, such as photolithography, etc.; these shortcomings greatly limit the commercial application of superhydrophobic materials

Method used

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  • A method for fabricating superhydrophobic and anti-reflective surfaces by femtosecond laser without mask
  • A method for fabricating superhydrophobic and anti-reflective surfaces by femtosecond laser without mask
  • A method for fabricating superhydrophobic and anti-reflective surfaces by femtosecond laser without mask

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Embodiment 1

[0036] Taking a copper substrate as an example, that is, the material to be processed 7 is copper, the implementation process of the method for manufacturing a super-hydrophobic and anti-reflection surface by a femtosecond laser without a mask of the present invention is described, including the following steps:

[0037] (1) Build as figure 1 The femtosecond laser processing system shown; the femtosecond laser processing system consists of femtosecond laser 1, aperture 2, attenuator 3, optical shutter 4, dichroic mirror 5; objective lens 6, material to be processed 7, six degrees of freedom translation stage 8 , Illumination lamp 9, beam splitter 10, charge coupled device (CCD) 11, computer 12. The femtosecond laser with a wavelength of 800nm, a pulse duration of 35fs, and a repetition frequency of 1kHz is generated by the femtosecond laser 1, and after passing through the diaphragm 2, attenuator 3, and optical shutter 4, it is reflected on the objective lens 6 by the dichroic mir...

Embodiment 2

[0045] A method for fabricating super-hydrophobic and anti-reflective surfaces by femtosecond laser without mask, the steps are as follows:

[0046] (1) Build as figure 1 The femtosecond laser processing system shown;

[0047] (2) such as figure 2 As shown, a layer of nano-thickness film is plated on a copper substrate using a magnetron sputtering coating method; in this embodiment, a silicon dioxide film is plated, and the thickness of the film is 100 nm. However, those skilled in the art know that in order to obtain different superhydrophobic and anti-reflection effects, it is not limited to silicon dioxide film coating here, and this method can be used to plate gold, silver and other materials with different thicknesses;

[0048] (3) such as figure 2 As shown, in the air, a femtosecond laser is used to selectively ablate and remove the silicon dioxide on a copper substrate plated with a silicon dioxide film to process a linear array structure. However, those skilled in the art ...

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Abstract

The invention relates to a maskless femtosecond laser manufacturing method for a super-hydrophobic and anti-reflective surface and belongs to the field of preparation of super-hydrophobic and anti-reflective materials. The maskless femtosecond laser manufacturing method for the super-hydrophobic and anti-reflective surface comprises the following steps that (1) a copper substrate is plated with a film of a nanometer thickness through electron beam evaporation or a magnetron sputtering coating method; (2) through a femtosecond laser direct writing method, patterning is conducted on the copper substrate plated with the film of the nanometer thickness, and the shape of patterning can be controlled through a program; (3) a heating device is used for conducting thermal oxidation treatment on the substrate obtained after femtosecond laser patterning, and then a micro-nanometer composite structure is prepared. Compared with the prior art, the maskless femtosecond laser manufacturing method for the super-hydrophobic and anti-reflective surface has the advantages that the manufacturing process does not need a vacuum device or an optical mask, and the manufactured substrate is controllable in shape and has the super-hydrophobic performance, the self-cleaning performance, the anti-reflective performance and other performances.

Description

Technical field [0001] The invention belongs to the field of preparation of hydrophobic and anti-reflection materials, and specifically relates to a method for manufacturing super-hydrophobic and anti-reflection surfaces by a femtosecond laser. Background technique [0002] The surface micro-nano structure has a wide range of applications in the fields of self-cleaning, super-hydrophobicity, oil-water separation, anti-reflection and Raman detection. In recent years, due to the wide application value of the surface micro-nano structure, it has received extensive attention from the scientific and industrial circles. The surface represented by the lotus leaf surface has a static contact angle greater than 150°, and a surface with a sliding angle less than 10° is called a superhydrophobic surface. Current research shows that the hydrophobicity of materials is determined by the chemical composition and surface structure of the material surface. The chemical composition of the materi...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B23K26/354B23K26/064C23C14/30C23C14/35C23C14/58
CPCB23K26/064B23K26/354C23C14/30C23C14/35C23C14/5806C23C14/5846
Inventor 姜澜胡洁曹伟毛振威芦勇
Owner BEIJING INSTITUTE OF TECHNOLOGYGY
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