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Silica glass precursor production method, silica glass precursor, silica glass production method and silica glass precursor

A silicon dioxide and manufacturing method technology, applied in the direction of silicon dioxide, glass manufacturing equipment, silicon oxide, etc., can solve the problem of not knowing the manufacturing method

Active Publication Date: 2017-10-13
KYUSHU UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

For example, alternative materials such as polyvinyl alcohol, which promote intermolecular bonding, are considered, but such a production method is not yet known.

Method used

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  • Silica glass precursor production method, silica glass precursor, silica glass production method and silica glass precursor
  • Silica glass precursor production method, silica glass precursor, silica glass production method and silica glass precursor
  • Silica glass precursor production method, silica glass precursor, silica glass production method and silica glass precursor

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0126] A solution was prepared by mixing the silica slurry prepared in the first preparation step and the solution prepared in the second preparation step in the above-mentioned examples at a weight ratio of 99:1 to 80:20, respectively. The prepared aqueous solution was poured into a mold having an arbitrary shape, irradiated with ultraviolet light or visible light for about 5 seconds to 60 seconds, and photocuring was confirmed. By removal from the mold, a molded body having an arbitrary shape is obtained. Table 1 shows the results of Examples as an example.

[0127] [Table 1]

[0128]

[0129] (100-X)(25wt% SiO2 dispersion)-X(98(2-HEA))-2(IRGACURE TPO)

[0130] In all cases, a silica glass precursor cured into a desired shape can be obtained within a curing time of 10 seconds to 30 seconds. The precursor was dried in a desiccator at 30° C. for 1 hour to have an average pore diameter of about 30 nm and a specific surface area of ​​196.4 m 2 g -1 mesoporous structure. ...

Embodiment 2

[0137] (Nanoparticles)

[0138] 33.5 g of silica nanoparticles (average primary particle diameter: 7 nm) were added to 66.5 g of distilled water, and ultrasonically dispersed to prepare 100 g of a 33.5 wt % silica nanoparticle dispersion. Add 100 μl of HNO to it 3 , adjust the pH to 3. In addition, a photopolymerization initiator (IRGACURE TPO, diphenyl(2,4,6-trimethylbenzoyl)phosphine oxide) was added to the monomer (4-hydroxybutyl acrylate, 4-HBA) to make Monomer: polymerization initiator=98:2 (wt%) ratio, and the monomer-polymerization initiator mixed solution was prepared. The obtained silica nanoparticle dispersion liquid and the monomer-polymerization initiator mixed liquid are mixed so as to have a predetermined ratio (for example, 99:1 to 70:30, more preferably 99:1 to 95:5) to produce SiO 2 -(4HBA) mixture. Flow the mixed solution into the container and irradiate UV-LED light with a wavelength of 385nm to obtain SiO 2 - (4-HBA) gel. The gel was removed from the ...

Embodiment 3

[0142] (Example 3) The effect on the final glass product when the acrylic monomer (4HBA) and the photopolymerization initiator (IRGACURE TPO) were changed under the same conditions as in the above-mentioned Example 2 was confirmed. Furthermore, a photopolymerization initiator (IRGACURE TPO, diphenyl(2,4,6-trimethylbenzoyl)phosphine oxide) was added to the monomer (4-hydroxybutyl acrylate, 4-HBA) to make Monomer: Polymerization Initiator = (100-x): x (wt%) (but the ratio of dispersion liquid: [acrylic acid monomer (4HBA) and photopolymerization initiator (IRGACURE TPO)] is set to a certain 95:5), Change the ratio x of the polymerization initiator to 1 to 10, and simultaneously prepare a monomer-polymerization initiator mixture to produce SiO 2 -(4HBA) mixture. The resulting nanocomposites were placed in the atmosphere or N 2, Ar, He gas or vacuum atmosphere at 1200 ° C to 1300 ° C as a result of firing, obtained a bulk silica glass transparent body. The chemical composition ...

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Abstract

The present invention provides a method for producing, at low cost, a dense and porous silica glass precursor from which silica glass can be easily formed in complex shapes at low cost, and which, in another use, can also be used in absorbents, etc., that utilize porousness. This silica glass precursor production method involves: an agitation step for producing a dispersion solution by agitating a silica solution that contains silica particles and a pH adjuster; a mixing step for producing a mixed solution by mixing into the aforementioned dispersion solution an initiator solution which comprises a photopolymerization initiator and an acrylic monomer configured to have a hydroxyl group at one end of an alkyl chain optionally substituted by a substituent, and to have, at the other end of said alkyl chain, an acryloyl group optionally substituted by an alkyl group; an irradiation step for forming a silica-containing molded body by irradiating the mixed solution with light; and a curing step for producing a mesoporous silica glass precursor formed by curing the aforementioned silica-containing molded body by firing and / or drying.

Description

technical field [0001] The present invention relates to a silica glass precursor (composite molded body) and silica glass and their production methods. In particular, the purpose of the present invention is to provide a dense porous silica glass precursor, its Methods of manufacture and uses thereof. Background technique [0002] Silica glass, which has excellent physical properties such as low thermal expansion, thermal stability, insulation, and high transmittance in the ultraviolet to visible range, is an important basic material that has been widely used in the past. Taking advantage of these characteristics, silica glass is used in crucibles for pulling semiconductor single crystals, high-intensity lamps, photomask substrates, and various optical components. Silica glass also has 10 in the high temperature region of about 2000 degrees 4 High viscosity of Pa·s. [0003] Therefore, the mainstream of the production method of silica glass having a complex shape is to mel...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03B20/00C01B33/12C01B33/18C03B8/02C08F2/44C08F2/50
CPCC01B33/12C03B20/00C08F2/44C08F2/50C01B33/18
Inventor 藤野茂
Owner KYUSHU UNIV