Transparent conductive film, optoelectronic device and manufacturing method thereof
A technology of transparent conductive film and manufacturing method, which is applied in semiconductor/solid-state device manufacturing, electric solid-state devices, semiconductor devices, etc., and can solve the problems of low OLED device performance, complicated preparation process, and difficulty in practical use, etc.
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Embodiment 1
[0060] like figure 1 As shown, the present invention provides a transparent conductive film, the transparent conductive film at least includes: a target structure 1; a silver nanowire film layer, the silver nanowire film layer is located on the surface of the target structure 1, and the silver nanowire film layer The film layer is a silver nanowire film layer whose surface has been heat-treated and hydrophilically treated; a transparent conductive polymer filling layer 3, which fills the gap inside the silver nanowire film layer and covers all The silver nanowire thin film layer. The silver nanowire thin film layer after hydrophilic treatment enables the transparent conductive polymer filling layer 3 to be uniformly coated thereon.
[0061] As an example, the target structure 1 can be a target substrate or a semiconductor structure with functional devices; when the target structure 1 is a target substrate, it can be a non-flexible substrate such as quartz glass, glass, or po...
Embodiment 2
[0068] like image 3 As shown, the present invention also provides a method for making a transparent conductive film, the method for making the transparent conductive film is suitable for making the transparent conductive film described in Example 1, and the method for making the transparent conductive film includes the following steps:
[0069] 1) Provide a target structure;
[0070] 2) forming a silver nanowire film layer on the target structure;
[0071] 3) A transparent conductive polymer filling layer is formed on the surface of the structure obtained in step 2), and the transparent conductive polymer filling layer fills the gap inside the silver nanowire thin film layer and covers the silver nanowire thin film layer.
[0072] In step 1), see image 3 Step S1 in and Figure 4 , providing a target structure 1 .
[0073] As an example, the target structure 1 can be a target substrate or a semiconductor structure with functional devices; when the target structure 1 is a ...
Embodiment 3
[0102] The present invention also provides an optoelectronic device, which includes the transparent conductive film as described in the first embodiment. The optoelectronic devices include but are not limited to OLED devices and photovoltaic devices such as amorphous silicon, copper indium gallium selenide, and heterojunction (HIT) solar cells.
[0103] In summary, the present invention provides a transparent conductive film, a photoelectric device and a manufacturing method thereof. The transparent conductive film includes: a target structure; a silver nanowire film layer located on the surface of the target structure; a transparent conductive polymer filling layer , filling the void inside the silver nanowire thin film layer and covering the silver nanowire thin film layer. The transparent conductive film of the present invention has the advantages of high conductivity and high transmittance; the transparent conductive polymer filling layer can be evenly coated on it by carr...
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