Optical transmissive AR glasses display chip and manufacturing method thereof
A technology of AR glasses and display chips, applied in optics, optical components, instruments, etc., can solve problems such as difficulty in miniaturization, short battery life, and inability to simultaneously display virtual and real information, so as to increase display density and reduce The effect of dot pitch
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Embodiment 1
[0050] Such as figure 1 and figure 2 , image 3 As shown, take a sapphire substrate and a blue LED epitaxial wafer with a light emission wavelength of about 465nm, and use a mixed solution of concentrated sulfuric acid:hydrogen peroxide at a ratio of 10:1 to clean the surface at a temperature of 90-115°C for 2-3 minutes; take it out after soaking and cleaning Rinse with deionized water for more than 10 minutes, take out nitrogen and blow dry for later use.
[0051] 1. Selectively etch the P-type layer of the LED epitaxial wafer by photolithography, ICP and other technologies according to the designed pixel unit size. The etching depth is based on the removal of the P-type layer of the LED epitaxial wafer; through etching, Micro LED pixel units are formed at intersections of rows and columns after etching on the surface of the epitaxial wafer.
[0052] 2. Through PECVD vapor deposition, a silicon dioxide protective film is deposited on the surface of the epitaxial wafer wit...
Embodiment 2
[0063] Such as figure 1 and figure 2 , image 3 As shown, take a sapphire substrate and a green LED epitaxial wafer with a light emission wavelength of about 520nm, and use a mixed solution of concentrated sulfuric acid:hydrogen peroxide at a ratio of 10:1 to clean the surface at a temperature of about 90-115 degrees for 2-3 minutes; soak and clean Then take out the deionized water for more than 10 minutes, take out the nitrogen gas and blow dry for later use.
[0064] 1. Selectively etch the P-type layer of the LED epitaxial wafer by photolithography, ICP and other technologies according to the designed pixel unit size, and the etching depth is about The removal of the P-type layer of the LED epitaxial wafer shall prevail; through etching, the micro-LED pixel unit is formed at the intersection of the etched row and column on the surface of the epitaxial wafer.
[0065] 2. Through PECVD vapor deposition, a layer of silicon dioxide protective film is deposited on the surfa...
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