Preparation method for porous graphene film and application of porous graphene film to capturing of carbon dioxide
A technology of porous graphene and filtration methods, applied in separation methods, chemical instruments and methods, membranes, etc., can solve problems such as difficult to prepare large-scale, defect-free, etc., achieve good physical and chemical properties, good market prospects, manufacturing low cost effect
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Embodiment 1
[0042] A preparation method of a porous graphene membrane, comprising:
[0043] Step 1: Preparation of porous α-Al by colloidal filtration method2 o 3 Substrate:
[0044] 11) α-Al with an average particle size of 300nm 2 o 3 The powder is dispersed in an aqueous solution and stabilized with nitric acid at pH=2;
[0045] 12) The above stabilized α-Al 2 o 3 The green body is obtained by vacuum filtration technology;
[0046] 13) drying the above green embryos in the air for 24 hours;
[0047] 14) Place the dried green body in a muffle furnace, and sinter it at 950°C for 10 hours in an air atmosphere to obtain a disc-shaped ceramic substrate with a uniform surface and no defects, wherein the heating and cooling rates of the muffle furnace are 2°C / min.
[0048] The resulting porous α-Al 2 o 3 Matrix porosity ~ 35%, thickness ~ 2mm, diameter 42.5mm, pore size ~ 100nm, surface pore size ~ 40nm, surface roughness ~ 30nm;
[0049] Step 2: Preparation of Gd-doped CeO by sono...
Embodiment 2
[0059] A preparation method of a porous graphene membrane, comprising:
[0060] Step 1: Preparation of porous α-Al by colloidal filtration method 2 o 3 Substrate: refer to Example 1 for specific steps;
[0061] Step 2: Preparation of 8.5 wt% Gd-doped CeO by sonochemical precipitation 2 The nanoparticle sol precursor, specific steps with reference to embodiment 1;
[0062] Step 3: Deposit a layer of Ce on the alumina substrate by dip-pulling method 0.9 Gd 0.1 o 1.95 (GDC) precursor film, make the GDC buffer layer by drying and rapid annealing process, to improve the bonding strength of the graphene film layer and the substrate, the specific steps are with reference to embodiment 1;
[0063] Step 4: Coating the graphene oxide suspension with a concentration of 1 mg / mL on α-Al by spin-coating process 2 o 3 On the supported GDC buffer layer, then dry the graphene oxide film in an oven at 110°C;
[0064] Step 5: Using H 2 Atmospheric thermal reduction process removes func...
Embodiment 3
[0067] A preparation method of a porous graphene membrane, comprising:
[0068] Step 1: Preparation of porous α-Al by colloidal filtration method 2 o 3 Substrate: refer to Example 1 for specific steps;
[0069] Step 2: Preparation of 8.5 wt% Gd-doped CeO by sonochemical precipitation 2 The nanoparticle sol precursor, specific steps with reference to embodiment 1;
[0070] Step 3: Deposit a layer of Ce on the alumina substrate by dip-pulling method 0.9 Gd 0.1 o 1.95 (GDC) precursor film, make the GDC buffer layer by drying and rapid annealing process, to improve the bonding strength of the graphene film layer and the substrate, the specific steps are with reference to embodiment 1;
[0071] Step 4: Coating the graphene oxide suspension with a concentration of 1.5 mg / mL on α-Al by spin coating process 2 o 3 On the supported GDC buffer layer, then dry the graphene oxide film in an oven at 110°C;
[0072] Step 5: Using H 2 Atmospheric thermal reduction process removes fu...
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