Fast preparation method of nanometer cerium dioxide dispersion liquid

A nano-cerium dioxide and dispersion liquid technology, which is applied in the field of nano-materials, can solve the problems of long production cycle, explosion of high-pressure liquid phase reaction equipment, complex process, etc., and achieve the effects of easy temperature control, improved stability, and low sedimentation rate

Inactive Publication Date: 2018-12-11
HEFEI UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The former nanocrystals are mostly prepared by co-precipitation, sol-gel and other methods. The heat treatment process has destroyed the functional groups on the surface of the grains. Subsequent hydrophilic coupling and modification are difficult, and the surface oxygen hole structure is easy to be destroyed. High surface area The severe agglomeration and sedimentation that can be caused will also leave flaws on the polished product; the latter forms a modification of the surface of the grain during the crystal growth process. Although the dispersion and stabilization effect is ideal, for large-scale mass production, the production cycle Long and complicated process, high-pressure liquid phase reaction equipment still has major safety risks such as explosion, and waste liquid recycling also has environmental protection problems

Method used

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  • Fast preparation method of nanometer cerium dioxide dispersion liquid
  • Fast preparation method of nanometer cerium dioxide dispersion liquid
  • Fast preparation method of nanometer cerium dioxide dispersion liquid

Examples

Experimental program
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Embodiment 1

[0033] 0.8 mmol cerium chloride heptahydrate (CeCl 3 ·7H 2 O) dissolved in 40ml deionized water, configured as cerium ion (Ce 3+ ) is an aqueous solution with a concentration of 0.02mol / L; the temperature is raised to 70°C at a rate of 5°C / min, and continuously stirred at a rate of 800rpm; the temperature of the aqueous solution is kept at 70°C, and 2.4mmol of NaOH is added thereto, and the stirring rate is maintained at 800rpm Continue the reaction for 0.5h until the precipitation is complete, reduce the stirring rate to 300rpm and continue the reaction for 3h; centrifuge the nanocrystals in the aqueous solution at a speed of 3000rpm, and use deionized water to ultrasonically clean 4 times to obtain ceria with a particle size of about 100nm Nanoparticles: Weigh 0.8g of the above-prepared ceria nanoparticles and redissolve them in 40ml of deionized water, and add 0.04g of PVA and 0.04g of SDBS to it, and ultrasonically treat them for 30min until they are uniformly dispersed t...

Embodiment 2

[0037] 0.8 mmol cerium chloride heptahydrate (CeCl 3 ·7H 2 O) and 0.05g SDBS are dissolved in 40ml deionized water to configure cerium ion (Ce 3+ ) is an aqueous solution with a concentration of 0.02mol / L; the temperature is raised to 70°C at a rate of 5°C / min, and continuously stirred at a rate of 800rpm; the temperature of the aqueous solution is kept at 70°C, and 2.4mmol of NaOH is added thereto, and the stirring rate is maintained at 800rpm Continue the reaction for 0.5h until the precipitation is complete, reduce the stirring rate to 300rpm and continue the reaction for 3h; centrifuge the nanocrystals in the aqueous solution at a speed of 3000rpm, and use deionized water to ultrasonically clean 4 times to obtain ceria with a particle size of about 800nm Particles: Weigh 0.8 g of the above-prepared ceria particles and redissolve them in 40 ml of deionized water, add 0.04 g of PVA and 0.3 ml of oleic acid to it, and ultrasonically treat for 30 minutes until uniformly dispe...

Embodiment 3

[0041] 0.8 mmol cerium chloride heptahydrate (CeCl 3 ·7H 2 O) dissolved in 40ml deionized water, configured as cerium ion (Ce 3+ ) concentration is an aqueous solution of 0.02mol / L; the temperature is raised to 90°C at a rate of 5°C / min, and continuously stirred at a rate of 800rpm; the temperature of the aqueous solution is maintained at 90°C, 2.4mmol of NaOH is added thereto, and the stirring rate is maintained at 800rpm Continue the reaction for 0.5h until the precipitation is complete, reduce the stirring rate to 300rpm and continue the reaction for 3h; centrifuge the nanocrystals in the aqueous solution at a speed of 3000rpm, and use deionized water to ultrasonically clean 4 times to obtain ceria with a particle size of about 50nm Nanoparticles: Weigh 0.8g of the above-prepared ceria nanoparticles and redissolve them in 40ml of deionized water, and add 0.04g of PVP and 0.3ml of Tween 80 to it, and ultrasonically treat them for 30min until they are evenly dispersed to obt...

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Abstract

The invention discloses a fast preparation method of nanometer cerium dioxide dispersion liquid. Ordinary pressure and low temperature water phase pyrolysis is combined with the air oxidation effect for fast preparing high-quality nanometer cerium dioxide dispersion liquid. By regulating the preparation process, the average grain diameter of cerium dioxide crystalline grains can be regulated in arange of 50 to 1000nm; the stabilization time of the dispersion liquid can reach 30 days or longer to several months. The cerium dioxide dispersion liquid can be widely applied to the fields of polishing, catalysis, luminescence, ultraviolet absorption and the like.

Description

technical field [0001] The invention relates to a rapid preparation method of a nano-cerium dioxide dispersion liquid, belonging to the field of nano-materials. Background technique [0002] Rare earth oxide is a mainstream abrasive material used in chemical mechanical polishing. It is a necessary abrasive in the manufacture of precision optical glass, semiconductor wafers and integrated circuit dielectric materials required in the upstream links of electrical, optical, and communication fields. , It is also an important means to improve the surface finish of precision devices. Ceria (CeO 2 ) as a typical light rare earth oxide with a fluorite structure, because its crystal lattice is easy to form oxygen holes, it is easier to chemically react with the surface of the material to be polished, thereby forming an effective chemical and mechanical polishing combination enhancement effect, its polishing Efficiency, polishing quality, service life, removal rate and environmental...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01F17/00B82Y40/00
CPCB82Y40/00C01F17/206C01P2002/72C01P2004/01C01P2004/03C01P2004/62C01P2004/64
Inventor 汪嘉恒王贤成李映欣吴喆吴玉程
Owner HEFEI UNIV OF TECH
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