Pulsed magnetic filtering and depositing device

Abstract

The invention discloses a pulsed magnetic filtering device which comprises a pulsed cathode arc head, an extraction electrode, a focusing straight pipe, a magnetic filtering pipe, a grid mesh and a radio frequency quadrupole filter. By implementing the pulsed magnetic filtering device, ions reaching the surface of a coated workpiece are good in directionality; meanwhile, the charge states of the ions are the same, and thus the pulsed magnetic filtering device is very suitable for refined adjusting and controlling growing of single-crystal films or poly-crystal films; and meanwhile, selective precise plating of the ion films with different valence states can be achieved conveniently by controlling the radio frequency of the quadrupole filter. The pulsed magnetic filtering device has the wide application prospects in preparation of ultrafine and ultra-micro chips or wafer seed crystals.

Description

technical field

[0001] The invention proposes a pulse magnetic filter deposition device for solving the problem of fine and atomic-level controllable coating. technical background

[0002] Metal vapor vacuum arc ion source (Metal Vapor Vacuum Arc), referred to as MEVVA source. This technology was developed in the mid-1980s by Brown, Adler and Burkhart of the University of California, Berkeley, for the needs of nuclear physics research. Because the MEVVA source can generate ion beams of various high-current metals and conductive compounds, it has the characteristics of strong beam current, various types of ions, high purity, high charge state, high extraction voltage and large-area extraction through holes. Using these ion beams can improve And improve the performance of metal material surface wear resistance, high temperature oxidation resistance, corrosion resistance and reduce surface friction coefficient. It can also improve the welding performance of ceramic and diamond...

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