A large area liquid crystal region alignment method based on mask exposure method and system thereof
An exposure system and large-area technology, which is applied in microlithography exposure equipment, photolithography exposure equipment, optics, etc., can solve problems affecting directional strength and uniformity, and achieve the effect of simple operation
Patent Information
- Authority / Receiving Office
- CN · China
- Current Assignee / Owner
- Publication Date
- 2019-01-08
- Estimated Expiration
- Not applicable · inactive patent
Smart Images

Figure 1 
Figure 2
Abstract
Description
technical field
[0001] The invention belongs to the technical field of light modulation, and specifically relates to a large-area liquid crystal region orientation method based on a mask exposure method and a mask exposure system, which are suitable for microprocessing technology and a liquid crystal-based light modulation method. Background technique
[0002] The liquid crystal display (LCD) industry is continuously updated due to the diverse market demands ranging from LCD TVs in household appliances to public information services in the social environment. With the development of the Internet, the demand for LCD panels in the global market is increasing. It is reported that since LCD replaced traditional cathode ray tube (CRT) non-flat panel display devices, the global LCD panel market production scale exceeded 100 billion US dollars in 2009. In 2018, South Korea , Japan, mainland China and Taiwan, China, the production capacity of LCD panels is nearly 300 million square ...
Examples
Embodiment 1
[0044] Initially, a mask plate with a one-dimensional grid structure pattern is prepared, and the pattern design area is 2cm*2cm; secondly, a polymerizable organic SU-8 photoresist is coated on the cleaned glass substrate, and the glue is shaken, pre-coated Polymerization treatment to obtain a polymer material sample with a flat surface and a thickness of about 10 μm; then an ultraviolet laser with a wavelength of 360nm and a spot radius of 1.5mm is used as the light source generation system, and the ultraviolet beam emitted by the laser is then passed through the beam parameter adjustment system. Glan Taylor prism and half-wave plate, adjust the laser processing power by rotating the angle of the half-wave plate, so that the beam power is measured as 40μw at the sample processing place, and then pass through a set of concave and convex lens combinations, by changing and adjusting the focal length of the lens and between The laser beam can be expanded and collimated, and finall...