Preparation method of organic photovoltaic module
An organic photovoltaic and module technology, applied in photovoltaic power generation, semiconductor/solid-state device manufacturing, semiconductor devices, etc., can solve the problems of incompatibility between processing cost and processing accuracy, avoid thermal effects and thermal damage, and have a wide range of applications. The effect of avoiding damage
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[0041] The invention provides a method for preparing an organic photovoltaic module, such as figure 1 shown, including the following steps:
[0042] Step 1. Prepare the dividing line P1 on the transparent electrode
[0043] Patterning is formed on the transparent conductive layer 2, or on the transparent conductive layer 2 and the first interface layer 3 deposited on the transparent conductive layer 2, by laser etching, inkjet printing, photolithography, mask plate method and sharp instrument The transparent electrode, get the dividing line P1 7;
[0044] The substrate 1 is arranged below the transparent conductive layer 2; the material of the substrate 1 is preferably glass, polyethylene terephthalate (PET) or polyimide (PI), more preferably glass, and the thickness is preferably 0.01-5mm, more preferably 3mm;
[0045]The material of the transparent conductive layer 2 is indium tin oxide (ITO), fluorine doped tin dioxide (FTO), aluminum doped zinc oxide (AZO), poly 3,4-eth...
Embodiment 1
[0063] Step 1. Preparation of patterned transparent electrodes:
[0064] After cleaning the ITO conductive glass with deionized water, isopropanol and acetone in sequence, blow it dry with high-purity nitrogen, treat it in a UV ozone processor for 20 minutes, and then place it on a spin-coating instrument holder, and spin-coat it with a thickness of 30nm at 3000rpm. PEDOT:PSS film is used as the first interface layer (hole transport layer); wherein, the substrate of the ITO conductive glass is glass, the transparent conductive layer is 180nm thick ITO, and the surface area of the ITO conductive glass is 30mm * 30mm. The ITO layer and the PEDOT:PSS layer are etched by a laser etching process to form a patterned transparent electrode (30mm×20mm), such as figure 2 Shown; Among them, the linear speed used in laser etching is 500mm s -1 , the energy used for etching is 1.8J cm -2 , other parameters are default; the width of the obtained etching line P1 is 52μm, and the distanc...
Embodiment 2
[0071] Step 1. Preparation of patterned transparent electrodes:
[0072]After cleaning the ITO conductive glass with deionized water, isopropanol and acetone successively, dry it with high-purity nitrogen, then place it on the spin coating instrument platform, and spin-coat a 40nm thick ZnO (zinc oxide) film at 3000rpm speed, and Anneal on a hot stage at 150°C for 30 minutes; wherein, the substrate 1 of the ITO conductive glass is glass, the transparent conductive layer is ITO with a thickness of 180nm, and the surface area of the ITO conductive glass is 30mm×30mm. The ITO layer and the ZnO layer are etched by a laser etching process to form a patterned transparent electrode; the linear speed used for laser etching is 500mm s -1 , the energy used for etching is 1.8J cm -2 , other parameters are default; the width of the obtained etching line P1 is 53 μm, and the distance between adjacent etching lines P1 (center) is 5 mm.
[0073] Step 2, preparing a patterned photosensiti...
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Abstract
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