Preparation method of Co-doped nano rod-like CuWO4 photoanode film
A nanorod-shaped, photoanode technology, applied in the direction of electrodes, electrolysis process, electrolysis components, etc., to achieve the effect of low raw material cost, simple and feasible preparation method, and good photoelectric catalytic hydrogen production performance
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Embodiment 1
[0017] The embodiment of the present invention discloses a Co-doped nanorod CuWO 4 A method for preparing a photoanode film, comprising the steps of:
[0018] Add 2.96g of ammonium metatungstate and 0.17g of cupric chloride into 50mL of absolute ethanol, stir magnetically at room temperature for 11min, and then follow Co 2+ and Cu 2+ The molar ratio of 0.02 / 0.94 was added to 0.009g cobalt nitrate, and the transparent Co-doped CuWO was obtained after stirring for 3h. 4 Precursor sol;
[0019] Put the cleaned ITO conductive glass on Co-doped CuWO at a speed of 1mm / s 4 After dipping in the precursor sol for 16s, pull it up, put it in an oven at 80°C to dry; then perform repeated coating, and dry the ITO conductive glass that has completed the second coating in an oven at 80°C for 1.5h;
[0020] The dried Co-doped CuWO 4 The film was annealed in a muffle furnace at 500 °C for 2 h to obtain Co-doped nanorod-shaped CuWO 4 Photoanodic film.
Embodiment 2
[0022] The embodiment of the present invention discloses a Co-doped nanorod CuWO 4 A method for preparing a photoanode film, comprising the steps of:
[0023] Add 2.96g of ammonium metatungstate and 0.17g of cupric chloride into 50mL of absolute ethanol, stir magnetically at room temperature for 13min, and then follow Co 2+ and Cu 2+ The molar ratio of 0.03 / 0.95 was added to 0.012g cobalt nitrate, and the transparent Co-doped CuWO was obtained after stirring for 4h. 4 Precursor sol;
[0024] Put the cleaned ITO conductive glass on Co-doped CuWO at a speed of 1mm / s 4 After dipping in the precursor sol for 21s, pull it up, put it in an oven at 80°C to dry; then perform repeated coating, and dry the ITO conductive glass that has completed the second coating in an oven at 80°C for 2 hours;
[0025] The dried Co-doped CuWO 4 The film was annealed in a muffle furnace at 520 °C for 2 h to obtain Co-doped nanorod-shaped CuWO 4 Photoanodic film.
Embodiment 3
[0027] The embodiment of the present invention discloses a Co-doped nanorod CuWO 4 A method for preparing a photoanode film, comprising the steps of:
[0028] Add 2.96g of ammonium metatungstate and 0.17g of cupric chloride into 50mL of absolute ethanol, stir magnetically at room temperature for 14min, and then follow Co 2+ and Cu 2+ The molar ratio of 0.06 / 0.98 was added to 0.015g of cobalt nitrate, and the stirring was continued for 3.5h to obtain transparent Co-doped CuWO 4 Precursor sol;
[0029] Put the cleaned ITO conductive glass on Co-doped CuWO at a speed of 1mm / s 4 After dipping in the precursor sol for 28s, pull it up, put it in an oven at 80°C to dry; then perform repeated coating, and dry the ITO conductive glass that has completed the second coating in an oven at 80°C for 3.5 hours;
[0030] The dried Co-doped CuWO 4 The film was annealed in a muffle furnace at 545 °C for 2 h to obtain Co-doped nanorod-shaped CuWO 4 Photoanodic film.
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