A kind of textured ta/ag wide temperature zone self-lubricating coating and its preparation method
A self-lubricating coating and texturing technology, applied in coatings, metal material coating processes, manufacturing tools, etc., can solve problems such as poor surface quality, large surface roughness, unfavorable lubricating film deposition and adhesion, etc. Achieve the effects of small heat-affected zone, low roughness, and excellent bearing effect
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[0034] The preparation method of the textured Ta / Ag wide temperature zone self-lubricating coating of the present invention comprises the following steps:
[0035] Step 1, pretreatment of the substrate: Grinding step by step with 180#, 400#, 600#, 800# sandpaper to remove the rust layer and oxide layer on the surface, polishing into a mirror surface, and ultrasonically ultrasonicating the substrate with acetone and alcohol before sputtering Wash for 15 minutes each, and then dry; in step 1, the base material is 45 steel.
[0036] Step 2, sputtering and depositing a Ta transition layer: using a DC magnetron sputtering method, sputtering a layer of Ta on the surface of the pretreated substrate as a transition layer. The specific process parameters of the DC magnetron sputtering method are: The vacuum degree is lower than 5.5*10 -3 Pa, the target base distance is 60mm, the working pressure is 0.1-0.4Pa, the argon flow rate is 40-60sccm, the sputtering power is 40-70W, and the sp...
Embodiment 1
[0046] (1) Pretreatment of the base material: take a 45 steel disc with a diameter of 45mm and a thickness of 1.5mm, and use 180#, 400#, 600#, 800# sandpaper to polish step by step to remove the surface rust layer and oxide layer, and then use W3.5 and W1 diamond paste for polishing. Put the polished substrate into a small beaker, add absolute ethanol to ultrasonically clean it for 15 minutes, and dry it.
[0047] (2) Preparation of Ta transition layer: A layer of Ta was sputtered on the surface of the pretreated substrate as a transition layer by using the DC magnetron sputtering method. The purity of the Ta target used was 99.95%. The DC magnetron sputtering method The specific process parameters are: the distance between the target and the base is 60cm, and the vacuum degree of the background is lower than 5.5*10 -3 Pa, the working pressure is 0.2Pa, the argon flow rate is 40sccm, the sputtering power is 70W, and the sputtering time is 2h;
[0048] (3) Surface texturing: ...
Embodiment 2
[0052] (1) Pretreatment of the substrate: same as in Example 1;
[0053] (2) Preparation of Ta transition layer: A layer of Ta was sputtered on the surface of the pretreated substrate as a transition layer by using the DC magnetron sputtering method. The purity of the Ta target used was 99.95%. The DC magnetron sputtering method The specific process parameters are: the distance between the target and the base is 60cm, and the vacuum degree of the background is lower than 5.5*10 -3 Pa, the working pressure is 0.2Pa, the argon flow rate is 40sccm, the sputtering power is 50W, and the sputtering time is 2h;
[0054] (3) Surface texturing: Etching the Ta transition layer in step 2 with a Nd:YAG pulsed laser with a wavelength of 1064nm, a pulse energy of 30μJ / pulse, a pulse width of 450ns-500ns, and a frequency range of 1-100Hz Regular micropores are arranged in an equilateral triangle array with a texture density of 6%.
[0055] (4) Ag lubricating phase deposited by sputtering: ...
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