Modified carbon nanotube array, carbon nanotube fiber, preparation method and application thereof
A carbon nanotube array and carbon nanotube fiber technology, applied in the direction of carbon nanotubes, single-walled carbon nanotubes, multi-walled carbon nanotubes, etc. Advanced problems, to achieve the effect of enhancing market competitiveness, perfect connection and light weight
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[0024] A method for preparing carbon nanotube fibers in one embodiment includes the following steps S110 to S140:
[0025] S110, preparing a modified carbon nanotube array.
[0026] In one of the embodiments, the step of preparing the modified carbon nanotube array includes S111~S113:
[0027] S111, depositing a carbon nanotube array on the first substrate.
[0028] In one of the embodiments, the step of depositing the carbon nanotube array on the first substrate includes S1111~S1112:
[0029] S1111. Deposit a catalyst layer on the first substrate.
[0030] In one embodiment, the catalyst layer is formed on the surface of the first substrate by electron beam evaporation. Further, the material of the catalyst layer is at least one selected from iron, cobalt and nickel. The thickness of the catalyst layer is 20nm-23nm.
[0031] S1112. In a protective gas atmosphere, the temperature of the first substrate on which the catalyst layer is formed is raised to 550°C-900°C, and th...
Embodiment 1
[0078] (1) Take a piece of the first substrate, deposit and form a 20nm thick catalyst layer on the first substrate, the catalyst layer is a mixed material of nickel and cobalt (the mass ratio of nickel and cobalt is 1:1), and then place the first substrate In the chemical vapor deposition reaction furnace, pass nitrogen gas, then raise the temperature to 900 ° C, and then feed carbon source gas into the chemical vapor deposition reaction furnace (carbon source gas includes ethylene and hexane, and the gas partial pressure ratio of ethylene and hexane is 1.25 : 1), and the flow rate of carbon source gas is controlled to react at 15L / min for 25min, so that the first substrate surface is completely covered with carbon nanotube arrays, the carbon nanotube arrays are single-walled carbon nanotube arrays, and the length of the carbon nanotube arrays The carbon nanotubes in the carbon nanotube array have a diameter of 15 nm.
[0079] (2) Take a second substrate, and form a polymer f...
Embodiment 2
[0083] (1) Take a piece of the first substrate, deposit and form a 23nm thick catalyst layer on the first substrate, the catalyst layer is a mixed material of iron, nickel and cobalt (the mass ratio of nickel and cobalt is 1:1), and then the first The substrate is placed in a chemical vapor deposition reactor and passed through nitrogen gas, then the temperature is raised to 550° C., and then a carbon source gas is introduced into the chemical vapor deposition reactor (the carbon source gas includes ethylene and hexane, and the gas partial pressure ratio of ethylene and hexane is 8:1), and the flow rate of the carbon source gas is controlled at 5 L / min for 10 min, so that the surface of the first substrate is completely covered with a carbon nanotube array, the carbon nanotube array is a single-walled carbon nanotube array, and the carbon nanotube array The length of the carbon nanotubes in the carbon nanotube array is 1180 μm, and the diameter of the carbon nanotubes is 15 nm....
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