Beauveria bassiana three-stage culture medium and preparation method thereof

A technology of Beauveria bassiana and culture medium, which is applied to the field of tertiary culture medium for Beauveria bassiana and its preparation field, can solve the problems of low yield and many miscellaneous bacteria, and achieves the effect of low-cost consumption

Active Publication Date: 2019-04-16
宜昌兴林生物科技有限公司 +1
View PDF4 Cites 4 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Beauveria bassiana spore powder currently produced in the market has a sporulation rate of about 100 billion/g, a

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0025] A tertiary culture medium for Beauveria bassiana, comprising the following raw materials in parts by weight: 25 parts of chaff, 25 parts of wheat bran, 0.006 parts of oxytetracycline and 40 parts of water.

Embodiment 2

[0027] A tertiary culture medium for Beauveria bassiana, comprising the following raw materials in parts by weight: 20 parts of chaff, 30 parts of wheat bran, 0.007 parts of oxytetracycline and 50 parts of water.

Embodiment 3

[0028] Example 3: A tertiary culture medium for Beauveria bassiana, comprising the following raw materials in parts by weight: 30 parts of chaff, 20 parts of wheat bran, 0.005 parts of oxytetracycline, and 30 parts of water.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a beauveria bassiana three-stage culture medium and a preparation method thereof. The beauveria bassiana three-level culture medium comprises, by weight, the following raw materials: 20-30 parts of husk, 20-30 parts of wheat bran, 0.001-0.01 part of oxytetracycline and 30-50 parts of water. KH2PO4 may also be included. By adding oxytetracycline in the culture medium formulaand the used water, most microorganisms in the tap water are killed, the low-microorganism environment state of the long-term culture medium of the beauveria bassiana of 5-7 days is further ensured,and the beauveria bassiana grows into a dominant strain in an open environment. By adopting the culture medium to carry out three-stage culture, the produced beauveria bassiana high spore pollen can reach the highest value of 230 billion per gram.

Description

technical field [0001] The invention relates to the field of preparation of Beauveria bassiana, in particular to a three-stage culture medium for Beauveria bassiana and a preparation method thereof. Background technique [0002] Beauveria bassiana (Beauveria bassiana) is an ascomycete fungus, which can be industrially cultivated and produced, and the conidia produced by it can be processed into microbial pesticides. Beauveria bassiana high sporopollen is non-toxic, tasteless, non-environmental pollution, and has continuous infectivity to pests. Once the pests are infected, they can be continuously disseminated and spread; they can parasitize more than 700 species of insects in 149 families of 15 orders, and are relatively safe for humans, animals and the environment. Pests are generally not easy to develop drug resistance, and can be used with certain chemical pesticides (insecticides, acaricides, fungicides) at the same time. The most successful control of Beauveria bassia...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): C12N1/14C12N3/00C12R1/645
CPCC12N1/14C12N3/00
Inventor 王永久胡玉伟戈媛媛毛永凯赵东容毛玉玲张建华李继虎唐桂林
Owner 宜昌兴林生物科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products