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Preparation method of solar cell

A technology for solar cells and silicon wafers, which is applied in the manufacture of circuits, electrical components, and final products, etc., can solve the problems of low yield, complex process, poor photoelectric conversion efficiency of solar cells, etc., and achieves high yield, simple process preparation, low cost effect

Pending Publication Date: 2019-06-18
COMTEC SOLAR JIANGSU
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Problems solved by technology

[0003] However, the existing process is complicated, the yield is low, and the photoelectric conversion efficiency of the solar cells prepared by the existing technology is poor.

Method used

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Examples

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Embodiment Construction

[0016] A method for preparing a solar cell, the steps are as follows:

[0017] (1) Clean the silicon wafer, first use NH 4 OH+H 2 o 2 After the reagent soaks the silicon chip for 6-7 minutes, take it out and dry it, and then use HCl+H 2 o 2 Soak the sample in +HF reagent for 8-10 minutes, take it out and dry it;

[0018] (2) The cleaned silicon wafer is polished and alkali-textured to form a light-trapping texture on both sides of the silicide, and boron is diffused on the front surface of the silicon wafer, and the silicon wafer is etched by etching to remove Borosilicate glass on the surface, the boron diffusion adopts the boron tribromide liquid source diffusion method, and first deposits boron tribromide at 900-1200°C with oxygen for 15-35 minutes, and then advances for 8-30 minutes without the source in an oxygen atmosphere. Minutes, then lower the temperature to 700-800°C and oxidize for at least 25-32 minutes, and grow an oxide layer on the backlight surface of the...

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Abstract

The invention discloses a preparation method of a solar cell. The preparation method comprises the following steps of firstly, cleaning a silicon wafer, and carrying out polishing, alkali texturing treatment and boron diffusion treatment, forming an oxide layer on the surface of the silicon wafer, and next, carrying out ion implantation, annealing treatment, phosphorus source deposition, laser doping treatment and subsequent treatment sequentially to complete the preparation of the solar cell. The invention discloses the preparation method of the solar cell. The preparation method is simple inprocess, high in yield, and low in damage; and a selective emitting electrode battery prepared by the method is high in square resistance uniformity and relatively low in cost.

Description

technical field [0001] The invention relates to a method for preparing a battery, in particular to a method for preparing a solar cell. Background technique [0002] Solar energy is a renewable and clean resource. Solar cells use solar energy for photoelectric conversion to provide users with electrical energy. The silicon matrix, the base material of polycrystalline silicon solar cells, has a high reflectivity to sunlight and cannot effectively absorb sunlight, resulting in low photoelectric conversion efficiency of solar cells. In the existing technology for preparing polycrystalline silicon solar cells, a single-layer silicon nitride anti-reflection film is deposited on the surface of the silicon substrate of the solar cell to reduce the reflectivity of sunlight and improve the absorption of solar energy by the solar cell, thereby improving the performance of the solar cell. Photoelectric conversion efficiency. [0003] However, the existing process is complicated, the ...

Claims

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Application Information

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IPC IPC(8): H01L31/18
CPCY02P70/50
Inventor 朱眉清
Owner COMTEC SOLAR JIANGSU
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