Manufacturing method of SiC substrate
A manufacturing method and substrate technology, applied in chemical instruments and methods, from condensed steam, single crystal growth, etc., can solve the problems of reducing the quality of SiC substrate production, low efficiency of silicon carbide single crystal production, and uneven surface of SiC substrate, etc. Achieve the effects of improving production efficiency, improving production quality, and fast sublimation speed
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[0022] The following clearly and completely describes the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only some of the embodiments of the present invention, but not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.
[0023] The invention discloses a method for manufacturing a SiC substrate, comprising the following steps:
[0024] S1. Prepare SiC powder and use it as a raw material;
[0025] S2. Place the SiC powder raw material in S1 in the crucible, install a seed crystal composed of SiC single crystal in the lid of the crucible, and recrystallize the raw material by sublimation, so that the SiC single crystal grows on the seed crystal, and then obtain A roughly cylindrical bulk single crystal of SiC;
[0026] S3, installing the SiC bulk sin...
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