A preparation method of two-terminal artificial synapse electronic device based on organic/inorganic hybrid perovskite
An electronic device, perovskite technology, applied in the field of artificial synapse electronic devices at both ends, can solve the problem of low sensitivity of artificial synapse, achieve high sensitivity, simplify the process, and reduce manufacturing costs
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Embodiment 1
[0025] (1) Divide 1.5×1.5cm 2 Put the highly doped silicon substrate into an acetone solution for ultrasonic cleaning for 15 minutes, then put it into an isopropanol (IPA) solution for ultrasonic cleaning for 15 minutes, then heat the IPA to boiling, and fumigate the surface of the substrate with IPA hot steam. then use N 2 Gun to dry its surface.
[0026] (2) Lead bromide (PbBr) with a molar ratio of 1:1 2 ) and methyl ammonium chloride (MACl) are mixed and dissolved in dimethylformamide (DMF) at a volume ratio of 4:1: dimethyl sulfoxide (DMSO) mixed solvent, and then the mixture is placed in a magnetic stirrer Stir until clear and transparent, and configure MAPbClBr with a mass fraction of 20% 2 perovskite solution.
[0027] (3) Place the obtained silicon substrate in an ultraviolet ozone cleaner for 20 minutes, take 50 μL of perovskite solution on the obtained silicon substrate with a pipette gun, -1 Spin coating at 5000r min for 10s, followed by -1 At the same time, ...
Embodiment 2
[0031] (1) Divide 1.5×1.5cm 2 Put the highly doped silicon substrate into an acetone solution for ultrasonic cleaning for 15 minutes, then put it into an isopropanol (IPA) solution for ultrasonic cleaning for 15 minutes, then heat the IPA to boiling, and fumigate the surface of the substrate with IPA hot steam. then use N 2 Gun to dry its surface.
[0032] (2) Lead bromide (PbBr) with a molar ratio of 1.1:1 2 ) and methyl amine bromide (MABr) are mixed and dissolved in dimethylformamide (DMF): dimethyl sulfoxide (DMSO) mixed solvent with a volume ratio of 5:2, and then the mixture is placed in a magnetic stirrer Stir until clear and transparent, and configure MAPbBr with a mass fraction of 20% 3 perovskite solution.
[0033] (3) Place the obtained silicon substrate in an ultraviolet ozone cleaner for 20 minutes, take 50 μL of perovskite solution on the obtained silicon substrate with a pipette gun, -1Spin coating at the speed of 15s, followed by 3500r min -1 At the same ...
Embodiment 3
[0037] (1) Divide 1.5×1.5cm 2 Put the highly doped silicon substrate into an acetone solution for ultrasonic cleaning for 15 minutes, then put it into an isopropanol (IPA) solution for ultrasonic cleaning for 15 minutes, then heat the IPA to boiling, and fumigate the surface of the substrate with IPA hot steam. then use N 2 Gun to dry its surface.
[0038] (2) Lead bromide (PbBr) with a molar ratio of 1:1 2 ) and methyl ammonium chloride (MACl) are mixed and dissolved in dimethylformamide (DMF) at a volume ratio of 4:1: dimethyl sulfoxide (DMSO) mixed solvent, and then the mixture is placed in a magnetic stirrer Stir until clear and transparent, and configure MAPbClBr with a mass fraction of 10% 2 perovskite solution.
[0039] (3) Place the obtained silicon substrate in an ultraviolet ozone cleaner for 20 minutes, take 70 μL of perovskite solution on the obtained silicon substrate with a pipette gun, -1 Spin coating at a speed of 10s, followed by 3000r min -1 At the same...
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