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Method for constructing micro-nano patterns in high-molecule film lamellas through selective dissolution

A polymer film and micro-nano pattern technology, applied in the field of polymer micro-nano material processing, can solve the problem of few researches on the lamellar micro-nano structure of the polymer film system

Active Publication Date: 2019-07-23
ZHENGZHOU UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

There have been a lot of studies on micro-nano processing technology in polymer conductive materials, but there are few studies on the micro-nano structure inside the lamellae of polymer film systems.

Method used

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  • Method for constructing micro-nano patterns in high-molecule film lamellas through selective dissolution
  • Method for constructing micro-nano patterns in high-molecule film lamellas through selective dissolution
  • Method for constructing micro-nano patterns in high-molecule film lamellas through selective dissolution

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Embodiment 1

[0061] A method for constructing micro-nano patterns inside polymer thin film lamellar crystals by selective dissolution, the method comprising the following steps:

[0062] (1) Preparation of PEO solution:

[0063] Use acetonitrile as a solvent to dissolve polyethylene oxide with a number average molecular weight of 4.6Kg / mol, then heat on a hot stage to 70°C for 1 hour to completely dissolve PEO in acetonitrile, and configure the mass fraction of PEO in the resulting solution to be 3wt %; then using acetonitrile to dilute the prepared solution to a mass fraction of PEO of 0.3wt%;

[0064] (2) Preparation of PEO film:

[0065] Take the P111 type silicon wafer and irradiate the oxidation treatment with ultraviolet light for 1 hour. After the treatment is completed, place the silicon wafer on a spin coater, and evenly drop the PEO acetonitrile solution (0.01~0.04g) diluted in step (1) on the silicon wafer. Then spin-coat at 4000rpm for 30s, and obtain a polyethylene oxide fil...

Embodiment 2

[0074] A method for constructing micro-nano patterns inside polymer thin film lamellar crystals by selective dissolution, the method comprising the following steps:

[0075] (1) Preparation of PEO solution:

[0076] Use acetonitrile as a solvent to dissolve polyethylene oxide with a number average molecular weight of 4.6Kg / mol, then heat on a hot stage to 70°C for 1 hour to completely dissolve PEO in acetonitrile, and configure the mass fraction of PEO in the resulting solution to be 3wt %; then using acetonitrile to dilute the prepared solution to a mass fraction of PEO of 0.3wt%;

[0077] (2) Preparation of PEO film:

[0078] Take the P111 type silicon wafer and irradiate the oxidation treatment with ultraviolet light for 1 hour. After the treatment is completed, place the silicon wafer on a spin coater, and evenly drop the PEO acetonitrile solution (0.01~0.04g) diluted in step (1) on the silicon wafer. Then spin-coat at 4000rpm for 30s, and obtain a polyethylene oxide fil...

Embodiment 3

[0087] A method for constructing micro-nano patterns inside polymer thin film lamellar crystals by selective dissolution, the method comprising the following steps:

[0088] (1) Preparation of PEO solution:

[0089] Use acetonitrile as a solvent to dissolve polyethylene oxide with a number average molecular weight of 4.6Kg / mol, then heat on a hot stage to 70°C for 1 hour to completely dissolve PEO in acetonitrile, and configure the mass fraction of PEO in the resulting solution to be 3wt %; then using acetonitrile to dilute the prepared solution to a mass fraction of PEO of 0.3wt%;

[0090] (2) Preparation of PEO film:

[0091] Take the P111 type silicon wafer and irradiate the oxidation treatment with ultraviolet light for 1 hour. After the treatment is completed, place the silicon wafer on a spin coater, and evenly drop the PEO acetonitrile solution (0.01~0.04g) diluted in step (1) on the silicon wafer. Then spin-coat at 4000rpm for 30s, and obtain a polyethylene oxide fil...

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Abstract

The invention discloses a method for constructing micro-nano patterns in high-molecule film lamellas through selective dissolution. According to the method, polyoxyethylene is utilized as a raw material and is completely dissolved into an organic solvent to obtain a mixed solution; the mixed solution is spin coated to a silicon wafer to obtain a polyoxyethylene film; melting isothermal crystallization is performed on the polyoxyethylene film under a nitrogen protective atmosphere; the organic solvent is utilized to dissolve the film subjected to the isothermal crystallization; the solvent is blown and dried after the dissolution is finished, and the different patterns can be constructed in the film lamellas. The method is simple and easy to operate; the method can be applied to constructing the different structural patterns in the high-molecule lamellas, can judge stability of the inside in the lamellas through structures and can provide technical research contents of important theoretical support and the like for researching the high-molecule crystallization materials. The effects on high-molecule crystallization can be theoretically deepened, a crystallization state can be regulated in actual application, performance is optimized, materials and products with preset performance can be obtained, and very important significances are achieved.

Description

technical field [0001] The invention belongs to the technical field of polymer micro-nano material processing. Specifically, it relates to a method for constructing micro-nano patterns inside polymer thin film lamellars by selective dissolution. Background technique [0002] With the rapid development of nanomaterials and nanotechnology, micro-nano processing technology has been deeply researched and explored in many fields. Studies have shown that substances can exhibit many new properties at the nanometer scale, such as surface effects, volume effects, quantum size effects, quantum tunneling effects, etc. The optical, electrical, magnetic, thermal, mechanical, mechanical and many other peculiar properties of ordinary materials, such as melting point, magnetism, chemistry, thermal conductivity, electrical conductivity, etc., often produce different properties that are not only different from microscopic atoms and molecules, but also different from the substance in the whol...

Claims

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Application Information

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IPC IPC(8): C08J7/00C08J7/02C08J5/18C08L71/02
CPCC08J7/02C08J7/00C08J5/18C08J2371/02
Inventor 张彬王雁陈静波申长雨
Owner ZHENGZHOU UNIV
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