Magnetron sputtering coating system and method for preparing dysprosium / terbium coatings

Abstract

The invention discloses a magnetron sputtering coating system for preparing dysprosium / terbium coatings on rare earth permanent magnet units. Magnetron sputtering sources used in the system have thecharacteristics of tubular structures, magnets are arranged on the outer sides of the pipe walls of the tubular magnetron sputtering sources, heavy rare earth target materials are embedded in the interiors of the tubular magnetron sputtering sources, and workpiece racks are installed on end covers and can rotate along the axes of the tubular magnetron sputtering sources. Coating spaces are formedin the tubular magnetron sputtering sources, and due to the coupling of magnetron sputtering discharge and hollow cathode discharge, the plasma density is high, so the deposition rate of a thin filmis much higher than that of conventional magnetron sputtering. Meanwhile, because of the characteristics of the tubular structures, the main parts of sputtering materials of target materials are deposited on workpieces, the other parts return to the surfaces of the target materials, and thus the system has a very high utilization rate of the target materials. In the meantime, the workpieces on theworkpiece racks are rotated along the axes of the tubular sources, the sputtering materials are uniformly received, and the dysprosium / terbium coatings with uniform thickness distribution are formed. The invention further discloses a magnetron sputtering coating method used on rare earth coatings.

Description

technical field [0001] The invention relates to the technical field of magnetron sputtering, in particular to a magnetron sputtering coating system and method for preparing a dysprosium / terbium coating on a rare earth permanent magnet unit. Background technique [0002] Sintered NdFeB magnet units have excellent comprehensive magnetic properties and have been widely used in many fields such as energy transportation, medical equipment, electronic communications, and instrumentation. In recent years, with the rapid development of new energy vehicles and wind power generation industries, new requirements have been placed on the performance of high-end sintered NdFeB magnet units, especially the heat resistance of the magnet units. Specifically, it is required that the magnet unit has a higher maximum energy product BHmax, and at the same time have an intrinsic coercive force Hcj as high as possible. Therefore, it is ensured that the magnet unit can be used for a long time unde...

AI Technical Summary

Problems solved by technology

There are following disadvantages in this type of method and system: 1 deposition rate is very low

The single-source deposition rate is less than 10 microns / hour; 2. The utilization rate of the target is very low. Although the sputtering utilization rate of a large number of tiled magnet unit blanks can reach more than 80%, due to the fixed position of the target material sputtering, the overall sputtering rate It is less than 40%, so the final target utilization rate is still only about 30%; 3. The equipment is expensive and complex, and the flexibility is poor; 4. In order to meet the requirements of mass production, this type of system mostly adopts a multi-source, multi-chamber structure, and the equipment cost is high. The reliability is poor, and the processing capacity for small batch orders is poor

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