A diamond-like coating composed of graphite-like particles and its preparation method and application
A diamond coating, graphite particle technology, applied in metal material coating process, coating, vacuum evaporation plating and other directions, can solve the problems of poor wear resistance and high friction coefficient, achieve excellent mechanical properties, high self-lubrication performance, wear resistance and self-lubricating properties
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Embodiment 1
[0032] 1. Preparation:
[0033] S1. The ion coating machine is equipped with a graphite target and a metal target. The graphite target is a flat target with a purity of 99.99%; the metal target is a Ti columnar target with a purity of 99.99%. The workpiece support is installed in the middle of the vacuum chamber.
[0034] S2. Cleaning the substrate: send the polished (100) oriented single crystal silicon substrate into an ultrasonic cleaning machine, and perform ultrasonic cleaning with acetone and absolute ethanol for 30 minutes respectively, and then clean it with deionized water, and then wash it with a purity ≥ 99.5% nitrogen blow dry.
[0035] S3. Vacuuming and ion beam etching cleaning chamber: clean the coating chamber with a high-power vacuum cleaner; place the substrate after ultrasonic cleaning on the workpiece support in the vacuum chamber, and vacuum the vacuum chamber to a vacuum of 5.0×10 -3 Below Pa, set the temperature to 80°C and then turn on the ion source, ...
Embodiment 2
[0041] 1. Preparation:
[0042] S1. The ion coating machine is equipped with a graphite target and a metal target. The graphite target is a flat target with a purity of 99.99%; the metal target is a Ti columnar target with a purity of 99.99%. The workpiece support is installed in the middle of the vacuum chamber.
[0043] S2. Clean the substrate: send the polished WC-Co cemented carbide substrate to the ultrasonic cleaning machine, and use acetone and absolute ethanol to conduct ultrasonic waves at 30kHz respectively. Clean for 30 minutes, then rinse with deionized water, and dry with nitrogen with a purity of ≥99.5%.
[0044] S3. Vacuuming and ion beam etching cleaning chamber: clean the coating chamber with a high-power vacuum cleaner; place the substrate after ultrasonic cleaning on the workpiece support in the vacuum chamber, and vacuum the vacuum chamber to a vacuum of 5.0×10 -3 Below Pa, the temperature is set to 100°C, then the ion source is turned on, 300 sccm of argo...
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