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Preparation method of Cr-doped DLC coating

A technology of coating and transition layer, applied in the field of preparation of DLC coating

Inactive Publication Date: 2019-10-08
HENAN UNIV OF SCI & TECH
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

There are few reports on the design and preparation of DLC film systems for tungsten-cobalt alloy, the most commonly used material for cemented carbide tools.

Method used

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  • Preparation method of Cr-doped DLC coating
  • Preparation method of Cr-doped DLC coating
  • Preparation method of Cr-doped DLC coating

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Experimental program
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Effect test

Embodiment 1

[0033] The preparation method of the Cr-doped DLC coating of the present embodiment comprises the following steps:

[0034] Step S1: Put the surface-treated tungsten-cobalt alloy substrate on the turret rod of the sputtering equipment cavity, and when the turret rotates as a whole, the turret rod rotates to ensure the uniformity of the coating;

[0035] Step S2: Use the long-column Cr target as the doping source, the long-lived graphite target as the source of the carbon element, and the flat Cr target as the source of the doping Cr element, which is evenly distributed and installed on the inner wall of the furnace, using high-purity Ar As the main ionized gas, to ensure an effective glow discharge process; respectively use Cr layer as the bottom layer, CrN, CrN 2 , Cr+C as gradient transition layer, high-purity N 2 As a transition layer reaction gas, C 2 h 2 As DLC layer reaction gas, forming Cr, CrN, CrN 2 , Cr+C, α-C:H multi-layer film system coating;

[0036] Step S3:...

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Abstract

The invention discloses a preparation method of a Cr-doped DLC coating. The advantages that the smoothness, uniformity and density of a high-power pulse magnetron sputtering film layer are high are sufficiently utilized, and a bottom layer and transition layer design method is adopted in order to overcome the defects that the binding force of the DLC coating and the toughness of the film layer arepoor. By means of the unique film system design and mixing process, it is guaranteed that the binding force of the coating is improved, and it is also guaranteed that the coating deposition rate, thecoating density and the wear resisting and friction reducing performance are improved. The appearance of the Cr-doped DLC coating prepared through the method is ash black, the surface is smooth and dense, the hardness of the coating is 32 GPa, the film-matrix binding force reaches 72 N, and the coating thickness is 1.45 micrometers. The dry friction coefficient of the coating is 0.2. It is shownthat the Cr-doped DLC coating has good wear resisting and friction reducing performance.

Description

technical field [0001] The invention belongs to the technical field of coating materials, and in particular relates to a preparation method of a Cr-doped DLC coating. Background technique [0002] Physical vapor deposition technology refers to the use of physical methods under vacuum conditions to vaporize material sources—solid or liquid surfaces into gaseous atoms, molecules or parts of them into ions, and deposit them on the surface of the substrate through a low-pressure gas (or plasma) process. The technology of thin films with certain special functions. The application number is "201210423173.5", and the patent name is "A method for preparing a Ti-doped diamond-like coating", which discloses a method for preparing a Ti-doped DLC coating. The pretreated substrate is placed in an arc and magnetic On the turret rod of the controlled sputtering composite coating equipment, the column arc Ti target is used as the Ti source, and the plane C target is used as the C source. T...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/02C23C14/06C23C14/14C23C14/34
CPCC23C14/0036C23C14/021C23C14/025C23C14/0605C23C14/0641C23C14/14C23C14/3485
Inventor 唐坤王广欣朱宇杰孙浩亮海茵茨罗尔夫斯托克
Owner HENAN UNIV OF SCI & TECH
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