Terahertz wave modulator based on strontium titanate all-dielectric metamaterial and preparation method of terahertz wave modulator
A technology of terahertz waves and strontium titanate, which is applied in instruments, nonlinear optics, optics, etc., can solve the problems of small power load, high temperature ablation, high frequency loss, etc., and achieve large modulation depth, large modulation depth, The effect of low loss
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[0062] In the second technical scheme of the present invention, a method for preparing a THz modulator based on strontium titanate microstructure is provided, which includes the following steps:
[0063] (1) Making polymer flexible substrate layer:
[0064] Using ordinary Si as the sacrificial layer, spray a solution containing a plastic flexible substrate on the sacrificial layer, and dry and solidify to obtain a polymer flexible substrate layer;
[0065] (2) Fabrication of doped semiconductor epitaxial layer:
[0066] Form a doped semiconductor epitaxial layer on the polymer flexible substrate layer by epitaxial growth;
[0067] (3) Making SiO 2 Insulation-strontium titanate microstructure composite layer:
[0068] (3-1) Atomic layer deposition of SiO on the doped semiconductor epitaxial layer 2 , Rinse clean, make SiO 2 Insulation;
[0069] (3-2) in SiO 2 Depositing a thin film of strontium titanate on the insulating layer, and then heating and annealing to complete the crystallization...
Embodiment 1
[0084] A THz modulator based on strontium titanate-based elliptical microstructure, including:
[0085] Polymer flexible substrate layer;
[0086] Semiconductor epitaxial layer: doped semiconductor Si layer formed by epitaxial growth method, with good insulation, in order to achieve the purpose of reducing loss;
[0087] SiO 2 Insulation-strontium titanate microstructure composite layer: grown on the semiconductor Si epitaxial layer, composed of a SiO 2 The structure unit composition of the insulating-strontium titanate microstructure layer, which specifically includes SiO located below 2 Insulating layer, and grown on SiO 2 Strontium titanate microstructure layer on the insulating layer.
[0088] In this embodiment, the polymer flexible substrate layer is made of a plastic flexible substrate solution, such as polyimide, with a thickness of 50 μm; the doped semiconductor epitaxial layer is a doped Si layer with a thickness of 10 μm, with carrier doping The concentration is 10 18 cm -3...
Embodiment 2
[0091] This embodiment provides a preparation process of a high quality factor THz modulator with strontium titanate-based elliptical microstructure, which specifically includes the following steps:
[0092] (1) Fabrication of the polymer flexible substrate layer: ordinary Si wafers are used as the sacrificial layer, and the solution containing the plastic polymer flexible substrate layer is sprayed on it by spincoated, and then dried in an oven for about 30 minutes , The temperature range is around 150-200℃ (preferably around 180℃), and then use a high-temperature furnace in inert gas (or N 2 ) Heated to 300-400°C (preferably 350°C) in a protective atmosphere to form a uniform polymer flexible substrate layer;
[0093] (2) Fabrication of doped semiconductor epitaxial layer: A semiconductor Si epitaxial layer with a thickness of 1-10μm (which can be 1μm, 5μm or 10μm, preferably about 5μm in this embodiment) is formed by an epitaxial growth method, with a doping concentration of 3×10...
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