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236 results about "Strontium titanium oxide" patented technology
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Strontium titanate is an oxide of strontium and titanium with the chemical formula SrTiO3. At room temperature, it is a centrosymmetric paraelectric material with a perovskite structure.
High quality epitaxial layers of monocrystalline III-V arsenidenitride materials can be grown overlying monocrystalline substrates such as large silicon wafers by forming a compliant substrate for growing the monocrystalline layers. One way to achieve the formation of a compliant substrate includes first growing an accommodating buffer layer on a siliconwafer. The accommodating buffer layer is a layer of monocrystalline oxide spaced apart from the siliconwafer by an amorphous interface layer of silicon oxide. The amorphous interface layer dissipates strain and permits the growth of a high quality monocrystalline oxide accommodating buffer layer. The accommodating buffer layer is lattice matched to both the underlying silicon wafer and the overlying monocrystalline III-V arsenidenitride material layer. Any lattice mismatch between the accommodating buffer layer and the underlying silicon substrate is taken care of by the amorphous interface layer. In addition, an accommodating buffer layer comprising a bariumstrontiumtitaniumoxide and a monocrystalline III-V arsenidenitride layer, such as GaAsN, having a nitrogen concentration ranging from 1-5% function to further reduce any lattice mismatch between layers.
There is provided an insulation material having a dielectric constant of 10 or more, comprising a filler having a dielectric constant of 50 or more and having two peaks in different particle size ranges in a particle size distribution and an insulating resin combined with each other; an insulation material having a dielectric constant of 10 or more comprising, as essential components, 1) at least one filler selected from the group consisting of bariumtitanate, strontiumtitanate, potassiumtitanate, magnesium titanate, lead titanate, titanium dioxide, bariumzirconate, calciumzirconate and lead zirconate, 2) an insulating resin and 3) a dispersant containing a carboxylic group; or an insulation material comprising a filler having a dielectric constant of 50 or more, a dispersant for dispersing the filler and an insulating resin as essential components, wherein an extract of a cured product of the insulation material obtained by extraction with water at 120° C. for 20 hours using a pressure vessel has a pH of 6 or higher.
The invention discloses a nano-composite organic spin valve, belonging to technical field of spintronics. The spin valve comprises a sandwich structure; a top electrode is a transitional metallic cobalt thin film which is provided with an aluminum thin film as a protective layer; a bottom electrode is a La-Sr-Mn-O thin film; a middle transport layer is a nano-composite of the transitional metallic cobalt and organic micro-molecular 8-hydroxyquinoline aluminum. The preparation method of the spin valve comprises the following steps of: preparing a La-Sr-Mn-O thin film bottom electrode of the spin valve on a strontiumtitanate substrate by using a laser pulse deposition method; preparing the middle transport layer of the transitional metallic cobalt and 8-hydroxyquinoline aluminum by thermal evaporation; preparing the transitional metallic cobalt thin film as the top electrode on the middle transport layer of the nano-composite; and heating for evaporating the aluminum thin film as the protective layer on the top electrode of the transitional metallic cobalt thin film.
A method for regulating and controlling a multiferroic BiFeO3 epitaxial film band gap on a SrTiO3 substrate comprises the following steps: 1) Selecting a strontiumtitanate substrate; 2) Making a BiFeO3 epitaxial film rich in Bi component grow on the SrTiO3 substrate; 3) Controlling an atomic percent of the Bi and Fe in the BiFeO3 epitaxial film and regulating crystal lattice mismatching of the BiFeO3 epitaxial film and the SrTiO3 substrate; 4) Controlling thickness of the grown BiFeO3 epitaxial film rich in Bi component and regulating an in-plane bi-axis stress of the BiFeO3 epitaxial film.
Novel anode materials including various compositions of vanadium-doped strontiumtitanate (SVT), and various compositions of vanadium- and sodium-doped strontium niobate (SNNV) for low- or intermediate-temperature solidoxide fuel cell (SOFCs). These materials offer high conductivity achievable at intermediate and low temperatures and can be used as the structural support of the SOFC anode and / or as the conductive phase of an anode. A method of making a low- or intermediate-temperature SOFC having an anode layer including SVT or SNNV is also provided.
The invention discloses a strontiumtitanatedielectric layer based meta-material wave absorbing device and a manufacturing method thereof. The wave absorbing device comprises a bottom structure, a middle dielectric layer and a top resonance structure, the bottom structure comprises at least a metal film layer, and the middle dielectric layer is fixed on the bottom structure. The top resonance structure is fixed on the middle dielectric layer, and comprises metalresonance structures arranged in an array. The metal resonance structures are all fixed in the end surface, far from the bottom structure, of the middle dielectric layer. The metal film and metal resonance structures are made of copper, and the middle dielectric layer is made of a SrTiO3 material. The SrTiO3 material serves as themiddle dielectric layer of the meta-material wave absorbing device, the outside ambient temperature can be changed to adjust the wave absorbing frequency and intensity actively, further the application field of the meta-material wave absorbing device is widened, incident electromagnetic waves in the terahertz frequency is controlled effectively, and development and application of terahertz science and technology are facilitated.
The invention discloses preparation of a BiVO4 / SrTiO3 composite photocatalyst, and is mainly applied to the technology of photocatalytic hydrogen production from water decomposition. A preparation method of the BiVO4 / SrTiO3 composite photocatalyst disclosed by the invention comprises the following steps: stirring BiVO4 and dispersing the BiVO4 in distilled water in an ultrasonic manner, then adding SrTiO3, stirring and processing in an ultrasonic manner; evaporating to dry the mixture in a water bath at a constant temperature of 40-60 DEG C; finally transferring into a muffle furnace, and calcining for 1-2 hours at a temperature of 450-500 DEG C to obtain the BiVO4 / SrTiO3 composite photocatalyst. According to the preparation method disclosed by the invention, a hydrogen producing material SrTiO3 serves as a main body, and a heterojunctioncomposite material is formed by compositing the SrTiO3 with the SrTiO3, so as to increase the migration rate of photoinduced electrons on a semiconductor BiVO4 interface, meanwhile the absorption range of the SrTiO3 in solar energy spectrum is widened, and therefore the performance of the SrTiO3 on photocatalytic hydrogen production from water decomposition is improved. Experimental results show that hydrogen production of the photocatalyst can reach 611.6mu mol / g in the process of hydrogen production from water decomposition.
The invention discloses a photo-thermal induced voltage thin-film material having response time of less than 10 ns, and the application of the material. Lal-xSrxCoO3 serves as a quick-response induced voltage material, wherein x is equal to 0.1 to 0.6. A thin film is grown on an inclined strontiumtitanate (SrTiO3) single-crystal substrate by using a pulse laser deposit technology and has photo-thermal radiationinduced voltage effects. Pulse laser light of which the pulse width is 28 ns and the wavelength is 248 nm is irradiated to the thin film, a quick-response large voltagesignal of which the response time is 7 ns and the full width at half maximum is 17ns is obtained in the inclination direction of the thin film, and the voltagesignal is acquired by a high-frequency oscilloscope. The photo-thermal induced voltage thin-film material is characterized in that: the response time is short; the material can operate at a wide optical spectrum of 0.19 to 11 mu m; the operation flow is easy, and energy sources are saved; the material can be used for manufacturing quick-response photo-thermal induced voltage detector devices; the response speed of a photo-thermal measuring instrument is increased; and the material is applicable to sensitive detection and tracking of pulse photo-thermal signals and military targets in the technical field of industry and the field of life.
Provided is an electrophotographic developing agent including: toner particles including a binder resin, a colorant, and a charge control agent; and an external additive added to the surface of the toner particles, wherein the external additive includes at least one inorganic particulate component and at least two types of strontiumtitanate particulate component having different mean primary particle diameters. Typically, the inorganic particulate component is not strontiumtitanate. Also, an electrophotographic image forming apparatus using the electrophotographic developing agent is provided. The strontiumtitanate particulate component having different mean primary particle diameters are used as an external additive to maintain uniform charging characteristics and to prevent fog in a non-image area, thereby obtaining good image quality. In addition, the external additives prevent deposition of the developing agent on a developing agent regulating blade due to stress when the developing agent is used for a long time.
The invention belongs to the field of capacitordielectric material preparation and relates to a dielectricceramic material with high-temperature stability and a preparation method thereof. The preparation method comprises the following steps of: pre-synthesizing base materials including bariumtitanate (BaTiO3), strontiumtitanate (SrTiO3), lead titanate (PbTiO3), calciumzirconate (CaZrO3) andBi2O3.nTiO2 by using bariumcarbonate (BaCO3), strontiumcarbonate (SrCO3), calciumcarbonate (CaCO3), lead oxide (PbO), bismuthtrioxide (Bi2O3), zirconiumoxide (ZrO2) and titaniumoxide (TiO2) as raw materials and by a solid-phase synthesis process, wherein n is 1 to 5; according to a proportioning requirement, mixing the base materials and auxiliary additives including magnesiumoxide (MgO) and manganese carbonate (MnCO3) and performing resynthesis by the solid-phase synthesis process; and then preparing the dielectricceramic material with high-temperature stability by the preparation process of the conventional dielectric ceramic material. According to detection, a ceramic capacitor manufactured by the dielectric ceramic material has the electrical characteristics that: the temperature change rate, namely absolute value of delta epsilon / epsilon25, is less than or equal to 5 percent (between 25 DEG C below zero and 85 DEG C); the dielectric constant epsilon25 is more than or equal to 1,000; the tangent tg delta of a loss angle is less than or equal to 1 percent; and the breakdown voltage VBDC is more than or equal to 10 KV / mm.
An embodiment of the invention provides a germanium-based NMOS device and a method for fabricating the same, which relates to fabrication process technology of an ultra-large-scale-integrated (ULSI) circuit. The germanium-based NMOS device has two dielectric layer interposed between a metal source / drain and a substrate. The bottom dielectric layer includes a dielectric material having a high pinning coefficient S such as hafniumoxide, siliconnitride, hafniumsiliconoxide or the like, and the top dielectric layer includes a dielectric material having a low conduction band offset ΔEC such as titaniumoxide, gallium oxide, strontiumtitanium oxide or the like. According to the method, Fermi level pinning effect can be alleviated, electron barrier height can be lowered, and thus performance of the germanium-based Schottky NMOS device can be improved. Compared with a conventional single dielectric layer such as aluminum oxide (Al2O3), Schottky barrier height can be lowered while low source / drain resistances can be maintained, and thus performance of the device can be significantly improved.