Arc ion plating device with center auxiliary anode

An arc ion plating and auxiliary anode technology, applied in ion implantation plating, sputtering plating, vacuum evaporation plating and other directions, can solve the problem of low coating rate, etc., achieve simple configuration, improve plasma density, plasma density Evenly distributed effect

Pending Publication Date: 2019-11-08
INST OF METAL RESEARCH - CHINESE ACAD OF SCI +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The object of the present invention is to provide an arc ion coating device configured with a central auxiliary anode to solve the problems of low coating rate and the like

Method used

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  • Arc ion plating device with center auxiliary anode

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Experimental program
Comparison scheme
Effect test

Embodiment 1

[0036] In this embodiment, the workpiece 304 stainless steel sheet with a size of 20×20×3 mm was ground, polished, ultrasonically cleaned and dried, and then placed on the workpiece turret of the vertical arc ion plating device. Such as figure 1 As shown, the arc ion plating device mainly includes: vacuum chamber 5, workpiece turret platform 2, workpiece turret 3, workpiece 6, substrate bias power supply 1, arc source target material 4, equipment upper center flange 8, auxiliary anode rod 7 , insulating block 9 and auxiliary anode power supply 10 etc., concrete structure is as follows:

[0037] The workpiece turret 2 is set at the bottom of the vacuum chamber 5, the workpiece turret 3 is set on the workpiece turret 2, the arc source target 4 is set on the side wall of the vacuum chamber 5, and the flange 8 is set at the center of the upper part of the equipment, and the flange 8 One or more auxiliary anode rods 7 are connected to each other. The auxiliary anode rods 7 are mad...

Embodiment 2

[0041] In this embodiment, the workpiece M2 high-speed steel sheet with a size of 20×14×3 mm is ground, polished, ultrasonically cleaned and dried, and placed vertically on the workpiece turret of the arc ion plating device. The difference from Embodiment 1 is that in this embodiment a horizontal arc ion plating equipment is used, the outer diameter of the auxiliary anode rod is 80 mm, and the distance between the auxiliary anode rod and the workpiece turret is 120 mm.

[0042] The arc source target is Ti30Al70at.% alloy target (atomic percentage), and the processed workpiece M2 high-speed steel sample is placed on the workpiece turret. Vacuum until the vacuum degree in the vacuum chamber reaches 8×10 -3 At Pa, argon gas is supplied, the air pressure is controlled at 0.6Pa, the arc-enhanced glow discharge ion etching source is turned on, and the negative bias voltage is applied to the workpiece through the substrate bias power supply in the range of -10V to -250V, and the bias...

Embodiment 3

[0045] In this embodiment, the workpiece M2 high-speed steel sheet with a size of 20×16×3 mm is ground, polished, ultrasonically cleaned and dried, and placed vertically on the workpiece turret of the arc ion plating device. The difference from Embodiment 1 is that in this embodiment a horizontal arc ion plating equipment is used, the outer diameter of the auxiliary anode rod is 100 mm, and the distance between the auxiliary anode rod and the workpiece turret is 90 mm.

[0046] The arc source target is Al67Cr33at.% (atomic percentage) alloy target, and the processed workpiece M2 high-speed steel sample is placed on the workpiece turret. Vacuum until the vacuum degree in the vacuum chamber reaches 7×10 -3 At Pa, argon gas is supplied, and the air pressure is controlled at 0.8Pa. The arc-enhanced glow discharge ion etching source is turned on, and a negative bias voltage is applied to the workpiece through the substrate bias power supply in the range of -10V to -260V, and the bi...

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Abstract

The invention belongs to the field of material surface modification, and relates to an arc ion plating device with a center auxiliary anode. One or more than two auxiliary anode rods are connected toa flange in the center of the upper part of an arc ion plating device; the auxiliary anode rods and the flange are insulated through insulating blocks; the auxiliary anode rods are made of red copperand adopt hollow water cooling; the auxiliary anode rods are connected with a positive pole of an auxiliary anode power supply; and a negative pole of the auxiliary anode power supply is connected tothe outer wall of a vacuum chamber. In the plating process, an electron produced in the vacuum chamber migrates under the action of an auxiliary anode electric field force, and a gas molecule is ionized in the migration process, so that the plasma density in the vacuum chamber is greatly improved, and the plating deposition efficiency and the thin film compactness can be effectively improved. Thearc ion plating device with the center auxiliary anode provided by the invention not only is suitable for arc ion plating equipment widely used industrially, but also is suitable for technologies suchas various ion plating with high ionization rate and high-power pulse magnetron sputtering, and the plasma density can be effectively improved.

Description

Technical field: [0001] The invention belongs to the field of material surface modification, and relates to an arc ion coating device equipped with a central auxiliary anode. Background technique: [0002] Arc ion plating technology has played an important role in the fields of tooling and mold surface strengthening due to its advantages of high ionization rate, fast deposition efficiency, and good plating performance. However, for ordinary industrial arc ion plating equipment, the coating deposition rate on the surface of the workpiece is mostly in the range of 1 to 3 microns / hour, which can meet the requirements for ordinary drills, milling cutters and other tools, but for serious wear And for workpieces with large loads, such as piston rings for automobiles, it is generally necessary to deposit a 20-micron thick CrN coating, which makes the required coating time extended to more than 6 hours, which significantly reduces the coating efficiency. [0003] In order to improv...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/32C23C14/06
CPCC23C14/0021C23C14/0641C23C14/325
Inventor 赵彦辉刘忠海王海于宝海王英智刘洋
Owner INST OF METAL RESEARCH - CHINESE ACAD OF SCI
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