Single nanoparticle light-scattering electrically regulated antenna and methods for its preparation and electrical regulation
A technology of nanoparticle and electrical control, applied in the direction of nanotechnology, nanotechnology, chemical instruments and methods, etc., can solve the problems of changing the properties of optical waveguides, affecting optical signals, and large device area, achieving compact structure, large control range, Simple operation effect
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Embodiment 1
[0058] Step S1: Select a lightly doped monocrystalline silicon wafer with a thickness of 0.5mm, cut the monocrystalline silicon wafer into a size specification of 1.5cm×1.5cm, place it in a rectangular quartz tank of 2cm×2cm×10cm, and cling to the right side of the quartz tank Place the polished side of the wall vertically outwards, and then inject deionized water into the quartz tank so that the deionized water does not cover the upper edge of the silicon wafer.
[0059] Step S2: Adjust the optical path of the femtosecond laser, first align the laser beam with the direction of the quartz trough through the total reflection mirror, and then select a focusing lens with a focal length of 10cm to focus the laser beam on the bullseye of the single crystal silicon wafer, and focus the laser beam to the target The diameter of the light spot on the surface of the material is 0.5cm, and the distance from the bullseye of the silicon wafer to the focal point is 2cm.
[0060] Step S3: Tu...
Embodiment 2
[0066] Step S1: Select a lightly doped monocrystalline silicon wafer with a thickness of 0.5mm, cut the monocrystalline silicon wafer into a size specification of 1.5cm×1.5cm, place it in a rectangular quartz tank of 2cm×2cm×10cm, and cling to the right side of the quartz tank Place the polished side of the wall vertically outwards, and then inject deionized water into the quartz tank so that the deionized water does not cover the upper edge of the silicon wafer.
[0067] Step S2: Adjust the optical path of the femtosecond laser, first align the laser beam with the direction of the quartz trough through the total reflection mirror, and then select a focusing lens with a focal length of 10cm to focus the laser beam on the bullseye of the single crystal silicon wafer, and focus the laser beam to the target The diameter of the light spot on the surface of the material is 0.5cm, and the distance from the bullseye of the silicon wafer to the focal point is 2cm.
[0068] Step S3: Tu...
Embodiment 3
[0074] Step S1: Select a lightly doped monocrystalline silicon wafer with a thickness of 0.5mm, cut the monocrystalline silicon wafer into a size specification of 1.5cm×1.5cm, place it in a rectangular quartz tank of 2cm×2cm×10cm, and cling to the right side of the quartz tank Place the polished side of the wall vertically outwards, and then inject deionized water into the quartz tank so that the deionized water does not cover the upper edge of the silicon wafer.
[0075] Step S2: Adjust the optical path of the femtosecond laser. First, align the laser beam in the direction of the quartz groove through the total reflection mirror, and then select a focusing lens with a focal length of about 10 cm to focus the laser beam on the bullseye of the single crystal silicon wafer. The diameter of the spot on the target surface is 0.5cm, and the silicon wafer bullseye is 2cm away from the focal point.
[0076] Step S3: Turn on the femtosecond laser, the pulse laser wavelength is 800nm, ...
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