Color filter photoresist stripping liquid composition

A color filter and composition technology, applied in the field of microelectronic materials, can solve the problems of long peeling time, serious taste, high operating temperature, and achieve no low-boiling organic volatiles, simple and convenient production process, and short peeling time. Effect

Pending Publication Date: 2019-12-20
华璞微电子科技(宁波)有限公司
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The above-mentioned published documents all have disadvantages such as poor stripping effect of color filter photoresist, long stripping time, high operating temperature, severe smell, and corrosion of glass substrates.

Method used

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  • Color filter photoresist stripping liquid composition
  • Color filter photoresist stripping liquid composition
  • Color filter photoresist stripping liquid composition

Examples

Experimental program
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Embodiment Construction

[0017] The present invention will be described in detail below in conjunction with specific embodiments:

[0018] The inorganic strong alkaline substance of the present invention may preferably be at least one of potassium hydroxide, sodium hydroxide and barium hydroxide, and the organic amine may preferably be hydroxylamine, monoethanolamine, N,N-dimethylethanolamine and diglycolamine The polar organic solvent may preferably be at least one of diethylene glycol monobutyl ether, dipropylene glycol monomethyl ether, benzyl alcohol, and propylene glycol phenyl ether.

[0019] The following eight examples and two comparative examples are given. The components used in each of them and the amounts of each component are shown in Table 1 below:

[0020] Table 1 The dosage of each component of Examples 1-8 and Comparative Examples 1-2

[0021]

[0022]

[0023] It can be seen from the content in Table 1 above that the difference between Comparative Example 1 and Example 3 is that the stabiliz...

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PUM

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Abstract

The invention discloses a color filter photoresist stripping liquid composition, and belongs to the technical field of microelectronic materials. The key point is that the composition comprises the following components in terms of mass percentage: 0.5-45% of inorganic strong alkaline substance, 0.1-50% of organic amine, 0.1-55% of polar organic solvent, 0.1-20% of stabilizer and 30-99.2% of water.The composition has the advantages of high stripping performance, short stripping time, low operation temperature, little corrosion to the glass substrate and the like, and the glass substrate can bereused after stripping. Meanwhile, the composition also has the characteristic of non-toxicity, non-corrosiveness, no low boiling point organic volatiles, no pollution to the environment, low foam and the like.

Description

Technical field [0001] The present invention belongs to the technical field of microelectronic materials, and relates to a composition, particularly a color filter photoresist stripper composition, which is used to selectively peel off the color loaded on the glass substrate of the poor color filter. Photoresist, so that the stripped glass substrate can be reused. Background technique [0002] Color Filter (CF) is a color filter film composed of three colors of red (R), green (G), and blue (B), which are regularly fabricated on a glass substrate, using the principle of light filtering , It produces three colors of red, green and blue. According to the different control voltages of the drive IC, the three colors are mixed in different types to produce a variety of colors. Color filters are the key raw material for liquid crystal display (TFT-LCD) panels to achieve color display. In addition, color filters can also be applied to other flat panel display products such as OLED. The...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/42
CPCG03F7/425
Inventor 刘江华付元涛章小琴
Owner 华璞微电子科技(宁波)有限公司
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