Method for improving wear resistance of parts of high-pressure hydraulic pump
A technology of hydraulic pump and wear resistance, which is applied in the field of hydraulic pump manufacturing, can solve the problems of high mechanical matching PVD coating, low hardness, unsatisfactory coating performance, and inability to obtain PVD coating, etc., to improve surface treatment efficiency, The effect of slowing down the difference in physical properties and hindering the propagation of cracks and defects
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Embodiment 1
[0029] According to the method for improving the wear resistance of high-pressure hydraulic pump parts in the present invention, the base material of the hydraulic pump parts is 32Cr2MoV, and the base body of the hydraulic pump parts is subjected to quenching, high-temperature tempering, rough and fine machining, and then carburized by ion plating, and then The HfMoZrTiC / Mo multilayer composite coating on the surface was deposited by ion plating and magnetron sputtering composite method. During deposition, 2 C ion plating targets, 1 Hf magnetron sputtering target, and 1 Mo magnetron sputtering target were used. 1 Zr magnetron sputtering target and 1 Ti magnetron sputtering target;
[0030] Specifically include the following steps:
[0031] (1) Parts processing: part matrix blank→quenching (845~890℃, water cooling)→high temperature tempering (520~580℃, water cooling)→rough machining→semi-finishing→stress relief tempering (520~560℃, air cooling )→finishing (surface roughness Ra...
Embodiment 2
[0044] According to the method for improving the wear resistance of high-pressure hydraulic pump parts in the present invention, the base material of the hydraulic pump parts is 20CrMnTi, and the base body of the hydraulic pump parts is subjected to quenching, high-temperature tempering, rough and fine machining, and then carburized by ion plating, and then The HfMoZrTiC / Mo multilayer composite coating on the surface was deposited by ion plating and magnetron sputtering composite method. During deposition, 2 C ion plating targets, 1 Hf magnetron sputtering target, and 1 Mo magnetron sputtering target were used. 1 Zr magnetron sputtering target and 1 Ti magnetron sputtering target;
[0045] Specifically include the following steps:
[0046] (1) Parts processing: part matrix blank→quenching (900~945℃, oil quenching)→high temperature tempering (525~600℃, air cooling)→rough machining→semi-finishing→stress relief tempering (555~595℃, Oil cooling)→finishing (surface roughness Ra1.6...
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