A low-power hydrogen detection method and its device and preparation method
A detection device and low power consumption technology, which is applied in the field of low power consumption hydrogen detection method and its device and preparation, can solve the problems such as the difficulty of miniaturization of the detection system, and meet the requirements of miniaturization of sensing, excellent hydrogen sensitivity characteristics, small The effect of power consumption
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Embodiment 1
[0040] A method for preparing a hydrogen detection device with low power consumption, comprising the following steps:
[0041] S1. Select monocrystalline silicon as the substrate, and use acetone, ethanol, and deionized water to clean it ultrasonically in sequence.
[0042] S2. The spin-polarized layer is prepared by mechanical transfer method, specifically, the topological insulator Bi is dissociated using adhesive tape 2 Se 3 A thin-layer topological insulator is obtained as a bulk material, and transferred to a single-crystal silicon substrate. The prepared thin-layer topological insulator has a thickness of 10-100 nm, a length of 10-50 μm, and a width of 5-30 μm.
[0043] S3. The barrier layer is prepared by a mechanical transfer method. Specifically, the graphene block is dissociated using adhesive tape to obtain a single-layer graphene, which is transferred to a topological insulator. The prepared single-layer graphene has a length of 10-50 μm and a width of 5 μm. -30 ...
Embodiment 2
[0047] A method for preparing a hydrogen detection device with low power consumption, comprising the following steps:
[0048] S1. Select monocrystalline silicon as the substrate, and use acetone, ethanol, and deionized water to clean it ultrasonically in sequence.
[0049] S2. The spin-polarized layer is prepared by mechanical transfer method, specifically, using adhesive tape to dissociate ferromagnetic metal Fe 3 GeTe 2 The bulk material is to obtain a thin layer of ferromagnetic metal, which is transferred to a single crystal silicon substrate. The thickness of the prepared thin layer of ferromagnetic metal is 10-100 nm, the length is 10-50 μm, and the width is 5-30 μm.
[0050] S3. The barrier layer is prepared by a mechanical transfer method. Specifically, a boron nitride block is dissociated using an adhesive tape to obtain a few-layer boron nitride, which is transferred to a ferromagnetic metal. The prepared graphene has a length of 10-50 μm and a width of 5-30 μm. ...
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