CrN/MoS2 solid self-lubricating composite film
A solid self-lubricating and composite film technology, which is applied in the direction of solid diffusion coating, ion implantation plating, superimposed layer plating, etc., can solve the problems of limited lubrication effect and low friction coefficient of CrMoN composite film, etc.
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Embodiment example 1
[0013] The raw materials for the preparation of CrN / MoS2 solid self-lubricating composite film include: Reagents used in the synthesis of nano-MoS2: sodium molybdate (A.R) (Shanghai Colloidal Chemical Factory). Hydroxylamine hydrochloride (A.R), thiourea (A.R) (Tianjin Standard Technology Co., Ltd.). Absolute ethanol (A.R) (Sinopharm Chemical Reagent Co., Ltd.). The preparation steps of CrN / MoS2 solid self-lubricating composite film are as follows: using magnetron sputtering equipment on N 2 The co-sputtering of the Cr target and the Mo target is carried out in the atmosphere, and a CrMoN composite film is deposited on the surface of the stainless steel with a thickness of 5-6 μm. The CrN / MoS2 solid self-lubricating composite film was prepared by using high-frequency pulsed plasma infiltration equipment and using sulfur vapor as the sulfurizing source to conduct 2h low-temperature (230°C) ion sulfurizing treatment on the surface of the film. The detection steps of CrN / MoS2 s...
Embodiment example 2
[0015] Thin films prepared by physical vapor deposition (PVD) mostly grow in the form of columnar crystals that are nearly perpendicular to the substrate. The crystals are densely arranged and the intercrystalline gaps are narrow, so that the prepared films have high purity and dense structure. The prepared two kinds of thin films have compact structure and uniform and smooth film surface. Through high-magnification observation, it can be seen that the crystal grains are fine and have reached the nanometer level. After sulfidation treatment, the grains of CrN / MoS2 composite film are further refined than those of CrMoN composite film. It plays an important role in improving film hardness and wear resistance. There are mainly Cr, Mo, N, and S elements on the surface of the CrN / MoS2 composite film, indicating that the S element can be successfully infiltrated into the film through low-temperature ion sulfurization. A trace amount of O element can also be detected on the surface...
Embodiment example 3
[0017] When the sputtering rate is 50nm / min, the thickness of the sulfurized layer of CrN / MoS2 composite film reaches more than 500nm, and the contents of Cr, Mo, and N elements gradually increase and tend to be stable with the increase of depth, and there is no Fe element in the composite film. The content of S element gradually decreases with the increase of depth; O element is enriched on the surface of the film layer, which originates from the slight oxidation of the air to the surface layer of the film. In addition, the component analysis of the film after 6min sputtering shows that the Mo atomic fraction in the CrN / MoS2 composite film is about 22%, the S atomic fraction is about 36%, and the Cr and N atomic fractions are about 19% and 23%. The Mo / S atomic ratio is about 0.6, and the Cr / N atomic ratio is about 0.8, indicating that the film layer contains a small amount of MoN in addition to MoS2 and CrN in stoichiometric ratio.
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