Preparation method, product and application of a nano-diamond metallized film
A nano-diamond and metallized film technology, which is applied in diamond, metal material coating technology, gaseous chemical plating, etc., can solve the problem of mismatch, decrease in film conductivity or number of catalytic active sites, and affect the performance of nano-diamond film, etc. problem, to achieve the effect of improving the binding force and improving the conductivity
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Embodiment 1
[0026] To prepare titanium oxide gel, the molar ratio of butyl titanate:ethanol:water is 1:18:40.
[0027] First mix butyl titanate with half of ethanol to form solution A; then mix water with the other half of ethanol to form solution B, adjust the pH value of solution B to 2 with nitric acid; add solution A to solution B drop by drop In, and stirring, after the dropwise addition is completed, it is left to age, and finally a titanium oxide gel is obtained.
[0028] Soak the 25 μm nano-diamond film in 75% concentrated sulfuric acid solution for 30 minutes, pick it up and dry it, the porous diamond film is made of a silicon substrate as the substrate prepared by the nano-diamond metallized film, and the metal oxide is coated by spin coating. The colloidal solution is spin-coated on the above-mentioned porous diamond film to a thickness of 10 μm, and dried under vacuum conditions of 150° C. to form a film. The film is subjected to plasma etching by microwave plasma method, the...
Embodiment 2
[0030] To prepare titanium oxide gel, the molar ratio of butyl titanate:ethanol:water is 1:18:20.
[0031] First mix butyl titanate with half of ethanol to form solution A; then mix water with the other half of ethanol to form solution B, adjust the pH value of solution B to 3.5 with nitric acid; add solution A to solution B drop by drop and stirring, after the dropwise addition is completed, it is left to age, and finally a titanium oxide gel is obtained.
[0032] Soak the 20 μm nano-diamond film in 75% concentrated sulfuric acid solution for 30 minutes, pick it up and dry, the porous diamond film is made of silicon substrate as the substrate prepared by the nano-diamond metallized film, and the metal oxide is coated by spin coating. The colloidal solution was spin-coated on the above-mentioned porous diamond film to a thickness of 3 μm, and dried to form a film at 200° C. in a vacuum environment. Adopt microwave plasma method to carry out plasma etching treatment to thin fi...
Embodiment 3
[0034] To prepare titanium oxide gel, the molar ratio of butyl titanate:ethanol:water is 1:15:20.
[0035] First mix butyl titanate with half of ethanol to form solution A; then mix water with the other half of ethanol to form solution B, adjust the pH value of solution B to 3.5 with nitric acid; add solution A to solution B drop by drop In, and stirring, after the dropwise addition is completed, it is left to age, and finally a titanium oxide gel is obtained.
[0036] Soak the 30 μm nano-diamond film in 75% concentrated sulfuric acid solution for 30 minutes, pick it up and dry, the porous diamond film is made of a silicon substrate as the substrate prepared by the nano-diamond metallized film, and the metal oxide is coated by spin coating. The colloidal solution is spin-coated on the above-mentioned porous diamond film to a thickness of 5 μm, and dried to form a film at 150° C. under a vacuum environment. The film is plasma-etched by microwave plasma method, the microwave po...
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