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Preparation method, product and application of a nano-diamond metallized film

A nano-diamond and metallized film technology, which is applied in diamond, metal material coating technology, gaseous chemical plating, etc., can solve the problem of mismatch, decrease in film conductivity or number of catalytic active sites, and affect the performance of nano-diamond film, etc. problem, to achieve the effect of improving the binding force and improving the conductivity

Active Publication Date: 2021-05-25
KUNMING UNIV OF SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in the process of chemical vapor deposition, there are often technical problems that due to the mismatch of the raw material gas ratio, a large amount of amorphous carbon is generated in the diamond film to fill the grain boundary, which greatly affects the performance of the nano-diamond film. Through chemical treatment, the amorphous carbon filled in the grain boundary position can be removed, and a diamond film with a porous structure, a nano-film with a porous structure, the structure presents a three-dimensional interconnected structure, and has the advantages of high specific surface area and multiple sites. It has broad application prospects in drug loading, chemical catalysis, sensors and other fields
However, the removal of the amorphous carbon film also causes the electrical conductivity of the film or the number of catalytic active sites to decrease, so how to further improve the electrical conductivity or the number of catalytic active sites of the nano-diamond film has become a technical problem to be solved urgently by those skilled in the art.

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  • Preparation method, product and application of a nano-diamond metallized film

Examples

Experimental program
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Effect test

Embodiment 1

[0026] To prepare titanium oxide gel, the molar ratio of butyl titanate:ethanol:water is 1:18:40.

[0027] First mix butyl titanate with half of ethanol to form solution A; then mix water with the other half of ethanol to form solution B, adjust the pH value of solution B to 2 with nitric acid; add solution A to solution B drop by drop In, and stirring, after the dropwise addition is completed, it is left to age, and finally a titanium oxide gel is obtained.

[0028] Soak the 25 μm nano-diamond film in 75% concentrated sulfuric acid solution for 30 minutes, pick it up and dry it, the porous diamond film is made of a silicon substrate as the substrate prepared by the nano-diamond metallized film, and the metal oxide is coated by spin coating. The colloidal solution is spin-coated on the above-mentioned porous diamond film to a thickness of 10 μm, and dried under vacuum conditions of 150° C. to form a film. The film is subjected to plasma etching by microwave plasma method, the...

Embodiment 2

[0030] To prepare titanium oxide gel, the molar ratio of butyl titanate:ethanol:water is 1:18:20.

[0031] First mix butyl titanate with half of ethanol to form solution A; then mix water with the other half of ethanol to form solution B, adjust the pH value of solution B to 3.5 with nitric acid; add solution A to solution B drop by drop and stirring, after the dropwise addition is completed, it is left to age, and finally a titanium oxide gel is obtained.

[0032] Soak the 20 μm nano-diamond film in 75% concentrated sulfuric acid solution for 30 minutes, pick it up and dry, the porous diamond film is made of silicon substrate as the substrate prepared by the nano-diamond metallized film, and the metal oxide is coated by spin coating. The colloidal solution was spin-coated on the above-mentioned porous diamond film to a thickness of 3 μm, and dried to form a film at 200° C. in a vacuum environment. Adopt microwave plasma method to carry out plasma etching treatment to thin fi...

Embodiment 3

[0034] To prepare titanium oxide gel, the molar ratio of butyl titanate:ethanol:water is 1:15:20.

[0035] First mix butyl titanate with half of ethanol to form solution A; then mix water with the other half of ethanol to form solution B, adjust the pH value of solution B to 3.5 with nitric acid; add solution A to solution B drop by drop In, and stirring, after the dropwise addition is completed, it is left to age, and finally a titanium oxide gel is obtained.

[0036] Soak the 30 μm nano-diamond film in 75% concentrated sulfuric acid solution for 30 minutes, pick it up and dry, the porous diamond film is made of a silicon substrate as the substrate prepared by the nano-diamond metallized film, and the metal oxide is coated by spin coating. The colloidal solution is spin-coated on the above-mentioned porous diamond film to a thickness of 5 μm, and dried to form a film at 150° C. under a vacuum environment. The film is plasma-etched by microwave plasma method, the microwave po...

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Abstract

The invention discloses a preparation method, product and application of a nano-diamond metallized film, which is specifically prepared by the following methods: using a chemical etching method to prepare a porous diamond film on a silicon substrate; combining the prepared diamond film with metal oxide The gel of the material is uniformly spin-coated to form a dense film and dried to make a porous nano-diamond / oxide composite film. The present invention aims at the problem of the decline in conductivity and active sites caused by the formation of a porous structure of the nano-diamond film. After reasonable post-processing of the diamond film, a metallized porous nano-diamond film material is effectively obtained.

Description

technical field [0001] The invention relates to the technical field of diamond films, in particular to a preparation method, product and application of a nano-diamond metallized film. Background technique [0002] Nano-diamond film refers to the thin-film nano-diamond material deposited on the surface of the substrate by various vapor deposition methods. It is composed of nano-diamond grains and amorphous carbon grain boundaries. Because it has high hardness, high thermal conductivity, and Acid and alkali resistance, chemical stability and other characteristics have been widely used in bioelectrode, chemical sewage treatment and other aspects. Its usual preparation method is to use carbon compounds and hydrogen as the main raw materials, and use chemical vapor deposition technology to form a diamond film on the surface of the substrate at low temperature and low pressure. The former provides carbon sources, and the latter provides atomic hydrogen to promote more carbon conve...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C16/56C23C16/27C01B32/28
CPCC23C16/27C23C16/56C01B32/28
Inventor 郭胜惠冯曙光杨黎刘秉国高冀芸
Owner KUNMING UNIV OF SCI & TECH