Preparation method of silicon-aluminum composite polishing powder

A composite polishing, silicon-aluminum composite technology, applied in polishing compositions containing abrasives, etc., can solve the problems of increasing processing costs and reducing production yield, and achieves guaranteed yield, excellent properties, and good reproducibility. Effect

Active Publication Date: 2020-04-28
湖南景翌湘台环保高新技术开发有限公司 +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, there is a small amount of sapphire substrate polishing liquid made of alumina powder as abrasive in the industry, and its removal rate can reach 8.0-10.0um / h, but compared with the traditional SiO 2 For abrasives, the production yield is greatly reduced, which increases the processing cost

Method used

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  • Preparation method of silicon-aluminum composite polishing powder
  • Preparation method of silicon-aluminum composite polishing powder

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0031] A preparation method of silicon-aluminum composite polishing powder, comprising the following steps:

[0032] (1) Take 1000 parts of 2.0mol / L ammonium bicarbonate and add 1 part of polyethylene glycol (molecular weight 2000) and 50 parts of ammonium hydroxide as a mother liquor and put them into a round bottom flask, then add 2000 parts of 0.2mol / L aluminum sulfate The ammonium solution was added dropwise at a speed of 20 parts / min while stirring at a high speed, keeping the reaction temperature at 60°C, and aging for 6 hours after the dropwise addition was completed to obtain an alumina precursor solution;

[0033] (2) Take another 30 parts of tetraethyl orthosilicate solution and drop it into a round bottom flask at a speed of 1 part / min while stirring at high speed, keep the reaction temperature at 30°C, and wait for 6 hours after the dropwise addition to obtain aging liquid;

[0034] (3) After the aging liquid is filtered by suction, the filter residue is washed wi...

Embodiment 2

[0040] A preparation method of silicon-aluminum composite polishing powder, comprising the following steps:

[0041] (1) Take 1000 parts of 2.0mol / L ammonium bicarbonate, add 5 parts of sodium hexametaphosphate and 30 parts of ethanolamine as a mother liquor and put it into a round bottom flask, then put 2000 parts of 0.2mol / L ammonium aluminum sulfate solution at 20 parts / The speed of min is dropped while stirring at a high speed, keeping the reaction temperature at 60°C, and aging for 6 hours after the dropwise addition is completed to obtain the alumina precursor solution;

[0042](2) Take another 30 parts of tetraethyl orthosilicate solution and drop it into a round bottom flask at a speed of 1 part / min while stirring at high speed, keep the reaction temperature at 30°C, and wait for 6 hours after the dropwise addition to obtain aging liquid;

[0043] (3) After the aging liquid is filtered by suction, the filter residue is washed with ultrapure water or distilled water, ...

Embodiment 3

[0047] A preparation method of silicon-aluminum composite polishing powder, comprising the following steps:

[0048] (1) Take 1000 parts of 2.0mol / L ammonium bicarbonate and add 1 part of polyethylene glycol (molecular weight 2000) and 50 parts of ammonium hydroxide as a mother liquor and put them into a round bottom flask, then add 2000 parts of 0.2mol / L aluminum sulfate The ammonium solution was added dropwise at a speed of 20 parts / min while stirring at a high speed, keeping the reaction temperature at 60°C, and aging for 6 hours after the dropwise addition was completed to obtain an alumina precursor solution;

[0049] (2) Take another 30 parts of tetraethyl orthosilicate solution and drop it into a round bottom flask at a speed of 1 part / min while stirring at high speed, keep the reaction temperature at 30°C, and wait for 6 hours after the dropwise addition to obtain aging liquid;

[0050] (3) After the aging liquid is filtered by suction, the filter residue is washed wi...

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Abstract

The invention discloses a preparation method of silicon-aluminum composite polishing powder. The method comprises the following steps: (1) stirring and reacting an ammonium bicarbonate solution and analuminum ammonium sulfate solution to prepare an aluminum oxide precursor solution; (2) dropwise adding tetraethoxysilane into the aluminum oxide precursor solution under high-speed stirring, and aging after stirring reaction to obtain an aged solution; (3) filtering the aging solution, collecting filter residues, drying and crushing to obtain a silicon-aluminum compound precursor; (4) uniformlymixing the silicon-aluminum compound precursor with a calcining accelerator, and calcining to obtain a silicon-aluminum compound; and (5) carrying out water washing, ball milling, water flow grading and spray drying on the silicon-aluminum compound to obtain the silicon-aluminum composite polishing powder. SiO2 and Al2O3 in the silicon-aluminum composite polishing powder obtained by the preparation method are chemically bonded, so that the silicon-aluminum composite polishing powder has the advantages of high polishing removal rate, good polishing stability, high polishing rate (up to 8.5-9.5mu m / h) and the like, and meanwhile, the polishing yield can also be improved.

Description

technical field [0001] The invention belongs to the field of preparation of inorganic abrasives, in particular to a preparation method of polishing powder. Background technique [0002] Single crystal sapphire has good physical, chemical and optical properties, and has been more and more widely used in the fields of microelectronics, industry, national defense, scientific research and GaN chip LED substrates. With the continuous development of science and technology, the requirements for processing precision and surface quality of sapphire wafers are getting higher and higher. Therefore, obtaining a high-efficiency and low-loss processing abrasive suitable for sapphire substrates has become a major obstacle to the development of the sapphire industry. [0003] According to research by researchers on the current sapphire substrate polishing process, the current mainstream process for sapphire substrate polishing uses SiO 2 Abrasives are used for ultra-fine polishing. Under t...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C09G1/02
CPCC09G1/02
Inventor 王鑫解付兵欧阳书径刘宜德刘力玮翟海军
Owner 湖南景翌湘台环保高新技术开发有限公司
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