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Polishing composition for ultra-precision surface manufacture of hard disk substrate

A polishing composition and ultra-precise technology, which are applied to polishing compositions containing abrasives, machine tools for surface polishing, manufacturing tools, etc. The surface quality is not obvious enough to achieve the effect of eliminating surface micro-scratch, reducing surface micro-defect and high polishing removal rate.

Inactive Publication Date: 2013-08-21
TSINGHUA UNIV +2
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The alkaline disk substrate polishing solution involved in the patent CN101016438A uses a variety of hard and soft abrasive grains, although it can reduce the scratches in the previous step of rough polishing, but the use of harder particles in the fine polishing will inevitably produce scratches, and the alkali The removal rate of Ni-P material on the polishing disk substrate is greatly limited by the non-toxic polishing liquid
The patent CN1384170A reduces micro-scratches to a certain extent after polishing the disc substrate by oxidant, organic phosphonic acid, and silicon oxide polishing composition, but the minimum surface roughness shown in the examples is only It can be seen that the improvement of the surface quality of the disk substrate after the technology involved is not obvious enough

Method used

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  • Polishing composition for ultra-precision surface manufacture of hard disk substrate

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0024] A kind of polishing composition that is used for the manufacture of the ultra-precision surface of the hard disk disc substrate, by weight percentage, the corrosive agent sulfuric acid is 2wt%, the oxidant hydrogen peroxide is 2wt%, the polishing accelerator potassium sulfate is 0.5wt%, the polishing balancer 0.5 wt% tetrasodium 2-phosphonic acid butane-1,2,4-tricarboxylate, 1 wt% stabilizer succinic acid, 5 wt% abrasive silicon oxide (average particle size 20nm), and the rest is water.

[0025] Under the condition of mechanical stirring, add corrosive agent, oxidant, polishing accelerator, polishing balancer, and stabilizer into deionized water according to the above ratio, mix thoroughly, then add abrasive, stir and mix evenly, and prepare a polishing composition, the pH of which is 1.59.

[0026] The prepared polishing composition is used for the polishing of the hard disk substrate, and the polishing conditions are as follows:

[0027] Polishing machine: double-sid...

Embodiment 2

[0055] A kind of polishing composition that is used for the manufacture of ultra-precision surface of hard disk disc substrate, by weight percent, corrosive agent phosphoric acid is 2.5wt%, oxidant hydrogen peroxide is 1.5wt%, polishing accelerator dipotassium hydrogen phosphate is 1wt%, The polishing balancer sodium citrate is 1wt%, the stabilizer lactic acid is 0.5wt%, the abrasive silica (average particle size is 20nm) is 5wt%, and the rest is water.

[0056] Under the condition of mechanical stirring, add corrosive agent, oxidant, polishing accelerator, polishing balancer, and stabilizer into deionized water according to the above ratio, mix thoroughly, then add abrasive, stir and mix evenly, and prepare a polishing composition, the pH of which is 1.74.

Embodiment 3

[0058] A polishing composition used for the manufacture of ultra-precision surfaces of hard disk substrates, in terms of weight percent, the corrosive agent hydrochloric acid is 1wt%, the oxidizing agent hydrogen peroxide is 0.5wt%, the polishing accelerator potassium chloride is 0.5wt%, and the polishing The balancing agent tetrasodium aminotrimethylene phosphonate is 1wt%, potassium citrate is 0.1wt%, the stabilizer salicylic acid is 3wt%, the abrasive silica (average particle size is 20nm) is 5wt%, and the rest is water.

[0059] Under the condition of mechanical stirring, add corrosive agent, oxidant, polishing accelerator, polishing balancer, and stabilizer into deionized water according to the above ratio, mix thoroughly, then add abrasive, stir and mix evenly, and prepare a polishing composition, the pH of which is 1.65.

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Abstract

The invention discloses a polishing composition for ultra-precision surface manufacture of a hard disk substrate, and belongs to the technical field of computer memory hard disk manufacture. The polishing composition comprises an abrasive, one or more corrosive agents, one or more oxidizing agents and water. The polishing composition is characterized in that the polishing composition also comprises one or more stabilizing agents, one or more polishing promoters and one or more polishing poising agents; the polishing promoters are inorganic salts; and the polishing poising agents are organic acidic salts. The polishing composition provided by the invention is mainly suitable for ultra-precision polishing in hard disk substrate manufacture, and has the characteristic of a high polishing removal rate. A hard disk substrate treated by the polishing composition has a smooth surface, does not have the defect of pit and protrusion formation, and has surface roughness below 0.3 angstroms and surface waviness below 0.5 angstroms. The polishing composition can effectively eliminate micro-defect such as surface micro-scratch, polishing traces and the like. The polishing composition is suitable for ultra-precision surface manufacture of a nickel and phosphor plated aluminum alloy substrate, a glass substrate and the like of a hard disk.

Description

technical field [0001] The invention belongs to the technical field of computer memory hard disk manufacturing, in particular to a polishing composition used for ultra-precision surface manufacturing of hard disk substrates. Background technique [0002] Computer hard disk has become an efficient and portable information storage system in modern life and production activities. It not only occupies an increasingly important position in the national economy, but also occupies a place in the history of human technology development. The hard disk is a magnetic recording system composed of a magnetic head and a hard disk. Its technical characteristics are high-speed relative motion, nanometer motion gap, and high-precision positioning and control. The system is designed and manufactured with high storage density, high-speed read and write capabilities, high reliability and zero wear. [0003] With the application of perpendicular magnetic recording technology in computer hard di...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/304C09G1/02C09K3/14B24B29/02
Inventor 潘国顺周艳罗桂海雒建斌路新春刘岩
Owner TSINGHUA UNIV
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