Preparation method of high-thermal-conductivity silicon nitride substrate
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- UNIV OF SCI & TECH BEIJING
- Publication Date
- 2020-05-19
Abstract
Description
technical field
[0001] The invention belongs to the technical field of ceramic material preparation, and relates to a method for preparing a silicon nitride substrate with high thermal conductivity. Background technique
[0002] At present, semiconductor devices are developing toward high power, high frequency, and integration. It is inevitable that devices will generate a lot of heat during operation, which is also the main reason for the failure of semiconductor devices. The thermal conductivity of the insulating substrate is the key to the heat dissipation of the entire semiconductor device, so how to improve the thermal conductivity of the substrate material is very critical. The ceramic substrates currently used in the market are mainly SiC and AlN. SiC ceramics have high thermal conductivity (120-180W / m K), but their dielectric loss is high and their insulation is poor, so their applications are limited; AlN has high thermal conductivity (160-230W / m K). K), but the c...