High-temperature-resistance and antioxidant infrared low-emissivity composite film and preparation method thereof
A composite film, low emissivity technology, applied in the field of infrared stealth, to achieve the effects of high melting point, simple film production and low cost
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[0019] Embodiment: A high temperature resistant, anti-oxidation infrared low emissivity composite film is a multi-functional layer superimposed structure, which successively includes a low emissivity functional layer 2, an oxidation protection film 3, and 1 is the surface of the target object; each layer Among them, mechanical bonding is the main bonding method, and the low-emissivity functional layer 2 is ZrB 2 Thin film, oxide protection film 3 is Al 2 o 3 film. The infrared low emissivity composite thin film of this embodiment is deposited on the Si substrate (1).
[0020] In the embodiment, the thickness of the low-emissivity functional layer is 400 nm, and the thickness of the oxidation protection film is 70 nm. The low-emissivity functional layer thickness is prepared by DC magnetron sputtering method, and the target material used is ZrB 2 Target (purity 99.99%), the oxidation protection film adopts radio frequency magnetron sputtering method to prepare, and used tar...
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