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A titanium-aluminum target material for physical vapor deposition and its preparation method

A physical vapor deposition, titanium-aluminum technology, applied in metal processing equipment, metal material coating process, transportation and packaging, etc., can solve the problems of coating performance change, target contamination, increased material contamination, etc. The effect of uniform and intermediate size, good machinability and shortening of production process

Active Publication Date: 2022-02-22
河北晟华新材料科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The hot pressing process has the following problems: (1) Sometimes it is necessary to add forming agents, which are difficult to completely remove in the subsequent de-agent process, which will cause contamination of the target and ultimately affect the coating quality
(2) The above-mentioned patents all use high temperature for hot pressing, resulting in the formation of hard and brittle intermetallic compounds inside the target, which brings a lot of trouble to subsequent machining, and even cracks during processing, making it impossible to produce targets with holes. Targets with complex shapes such as threads
(3) When producing a target with a thickness greater than 30 mm, it is easy to cause a difference in the density of the target along the thickness direction. When the sputtering process parameters are determined, this difference in density will cause a change in the thickness of the coating, which will eventually lead to coating performance. The change
[0005] Using cold isostatic pressing or other pre-pressing methods can indeed increase the packing density of the sheath, but at the same time it brings other adverse effects: 1. Increase the production process and increase production costs; 2. The use of cold isostatic pressing requires the use of liquid medium, which will increase the chance of contamination of the material; 3. When molding is used, a larger blank cannot be realized, and it is easy to cause the powder density near the indenter to be high, while the powder far away from the indenter is less dense and heat After isostatic pressing, the size of the two ends of the billet is large, while the middle size is small

Method used

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  • A titanium-aluminum target material for physical vapor deposition and its preparation method
  • A titanium-aluminum target material for physical vapor deposition and its preparation method
  • A titanium-aluminum target material for physical vapor deposition and its preparation method

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Effect test

Embodiment 1

[0043] Step (1), the weighing ratio is 46.65 parts of titanium powder and 53.35 parts of aluminum powder (corresponding to atomic percentage TiAl33 / 67at%), titanium powder and aluminum powder are put into V-shaped mixer for mixing, wherein titanium The particle size of the powder is -300 mesh, +500 mesh, and the purity is 99.6%; the particle size of the aluminum powder is -200 mesh, +500 mesh, and the purity is 99.6%.

[0044] In step (2), the uniform powder mixed in step (1) is packed into an aluminum sheath with a thickness of 3 mm.

[0045] Step (3), put the bag filled with powder in step (2) into a well-type resistance furnace for degassing; the degassing temperature is 350 ° C, and the vacuum degree reaches 2 × 10 -3 Pa and then keep it warm for 10 hours; after the degassing is completed, flatten and cut the sheathed degassing tube, and quickly seal it with argon arc welding.

[0046]In step (4), hot isostatic pressing is performed on the sheath that has been degassed in...

Embodiment 2

[0050] Step (1), the weighing ratio is 63.95 parts of titanium powder and 36.05 parts of aluminum powder (corresponding to atomic percentage TiAl50 / 50at%), titanium powder and aluminum powder are put into V-shaped mixer for mixing, wherein titanium The particle size of the powder is -300 mesh, +500 mesh, and the purity is 99.6%; the particle size of the aluminum powder is -200 mesh, +500 mesh, and the purity is 99.6%.

[0051] In step (2), the uniform powder mixed in step (1) is packed into an aluminum sheath with a thickness of 3 mm.

[0052] Step (3), put the bag filled with powder in step (2) into a well-type resistance furnace for degassing; the degassing temperature is 350 ° C, and the vacuum degree reaches 2 × 10 -3 Pa and then keep it warm for 12 hours; after the degassing is completed, flatten and cut the sheathed degassing tube, and quickly seal it with argon arc welding.

[0053] In step (4), hot isostatic pressing is performed on the sheath that has been degassed i...

Embodiment 3

[0057] Step (1), the weighing ratio is 46.65 parts of titanium powder and 53.35 parts of aluminum powder (corresponding to atomic percentage TiAl33 / 67at%), titanium powder and aluminum powder are put into V-shaped mixer for mixing, wherein titanium The particle size of the powder is -300 mesh, +500 mesh, and the purity is 99.6%; the particle size of the aluminum powder is -200 mesh, +500 mesh, and the purity is 99.6%.

[0058] In step (2), the uniform powder mixed in step (1) is packed into an aluminum sheath with a thickness of 3 mm.

[0059] Step (3), put the bag filled with powder in step (2) into a well-type resistance furnace for degassing; the degassing temperature is 350 ° C, and the vacuum degree reaches 2 × 10 -3 Pa and then keep it warm for 10 hours; after the degassing is completed, flatten and cut the sheathed degassing tube, and quickly seal it with argon arc welding.

[0060] In step (4), hot isostatic pressing is performed on the sheath that has been degassed i...

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Abstract

The invention provides a titanium-aluminum target material for physical vapor deposition and a preparation method thereof. The preparation method comprises: providing titanium powder and aluminum powder; mixing the titanium powder and aluminum powder uniformly; filling the uniformly mixed powder Enter the sheath; degas the sheath filled with powder; perform hot isostatic pressing on the sheath after degassing, under high temperature and high pressure, the powder is dense inside the sheath and form an ingot; the ingot is mechanically Processed into titanium aluminum target. The prepared titanium-aluminum target has the following advantages: (1) The target material and density distribution are uniform, and the density is high, and there are no pores; (2) Since there is no generation of brittle intermetallic compounds, the target has good machinability and can be Realize the processing of targets with complex shapes; (3) The preparation method of titanium-aluminum targets provided by the present invention can realize the production of titanium-aluminum targets with high aluminum content that cannot be achieved by smelting methods; (4) Compared with hot pressing methods and The smelting method can realize the production of large-size titanium-aluminum targets.

Description

technical field [0001] The invention relates to the technical field of powder metallurgy, in particular to a titanium-aluminum target material for physical vapor deposition and a preparation method thereof. Background technique [0002] With the development and maturity of physical vapor deposition technology, thin films and coatings are more and more widely used in modern industry. The titanium aluminum target is prepared on the surface of the workpiece by physical vapor deposition technology. This hard coating has the characteristics of high hardness, stable chemical properties, high temperature resistance, etc., so as to play a role in wear resistance, corrosion resistance, oxidation resistance, etc. Purpose, especially in molds, tools, machinery and other fields have a wide range of applications. In addition, with the rapid development of the modern decoration industry, the requirements for the color and wear-resistant and anti-corrosion of decorative materials are gett...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B22F1/052B22F3/15B22F5/00C23C14/34C22C21/00C22C14/00
CPCB22F3/15B22F5/00C23C14/3414C22C21/003C22C14/00B22F1/052
Inventor 李群许鹏国李卫杨海勇
Owner 河北晟华新材料科技有限公司