Grating manufacturing process for adhering heavy metal colloid to light metal film

Abstract

The invention belonging to the field of optical elements discloses a grating manufacturing process for adhering heavy metal colloid to a light metal film.. The process comprises the following five steps of preparing a heavy metal colloidal solution, adding an adhesive, adhering a heavy metal colloidal solution, manufacturing a composite film lamination, performing cutting and performing packaging.Firstly, heavy metal colloid is prepared through heavy metal salt; an adhesive which is easy to volatilize after being heated is added into the heavy metal colloid to increase the viscosity of the heavy metal colloid; a light metal film is adhered to the viscous heavy metal colloid to obtain two adhesive light metal films adhered with heavy metal layers, the light metal films and the adhesive light metal films are folded in a staggered manner to obtain a composite film stack, and finally the composite film stack is cut and packaged to obtain the grating. The whole grating preparation method is short in grating preparation period, low in cost and price and convenient and fast in preparation process. The manufactured structure cannot collapse, the grating with any area is manufactured by controlling the width of the light element metal plate, and the X-ray grating can be produced on a large scale through one-time manufacturing.

Description

technical field [0001] The invention relates to the technical field of optical elements, in particular to a grating manufacturing process in which a light metal film is adhered to a heavy metal colloid. Background technique [0002] X-ray imaging technology has developed rapidly as a brand-new subject since the discovery of X-ray by German researcher Roentgen in 1895. It can detect the internal defects of welds and equipment, and is widely used in machinery manufacturing, pressure vessels, aviation, etc. Aerospace, petroleum, chemical industry, railway transportation, metallurgy, shipbuilding, military and other industrial sectors; the current grating production process mainly uses DRIE technology, LIGA technology and silicon-based photo-assisted electrochemical etching technology. [0003] DRIE is an anisotropic dry etching technology, which is based on inductively coupled plasma for deep processing of silicon or other materials; firstly, the mask plate is covered on the su...

AI Technical Summary

Problems solved by technology

However, in the process of research, it is found that when the grating 7 is made by this method, the grating 7 often breaks and collapses, which causes structural failure.

And the production cost is high, and the production area is small

[0005] The photo-assisted electrochemical etching method has a complicated process, and the silicon-based resistivity, temperature, etc. during the production process have a great influence on the etching structure, which is difficult to control. In the later stage of high atomic number metal filling process, all The required filling process is complex and the conditions are relatively harsh

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