Method for improving polarization degree of perovskite quantum dot film

Abstract

The invention discloses a method for improving the polarization degree of a perovskite quantum dot film. The method is used for etching the perovskite quantum dot film based on a laser direct writingtechnology under the condition that an external condition is not changed so as to improve the polarization degree of the perovskite quantum dot film, and specifically comprises the following steps offirstly cleaning a substrate which is a substrate spin-coated with the perovskite quantum dot film; drying the cleaned substrate, and then putting the substrate into a UV O3 cleaning machine for continuous cleaning; putting the cleaned substrate on film preparation equipment, and preparing a thin film by using the prepared perovskite quantum dot material to obtain a perovskite quantum dot thin film; and finally, scanning the perovskite quantum dot film by laser direct writing. The perovskite quantum dot thin film is processed by adopting a laser direct writing technology, the tissue morphologyof the thin film is changed by laser, the preparation process is simpler, the manufacturing cost is lower, the large-area preparation can be carried out, and the polarization test can prove that thepolarization degree after laser processing is improved.

Description

technical field [0001] The invention relates to a method for improving the polarization degree of a perovskite quantum dot film, which belongs to the technical field of new materials. Background technique [0002] Polarization is an important characteristic of electromagnetic waves, and polarization is another important property of light besides wavelength, amplitude and phase. Polarized light is necessary for applications such as display, imaging, and information storage. Common applications are liquid crystal display (LCD) backlighting, labeling of biological systems, optical quantum computers, and three-dimensional display systems. For some luminescent materials, the emitted light can be polarized by certain means, which can broaden its application in display, data storage, information encryption and other aspects. In recent years, the research on perovskite materials has attracted attention. Its advantages such as high fluorescence quantum efficiency, long carrier diff...

AI Technical Summary

Problems solved by technology

However, the above-mentioned methods all have their own deficiencies and defects, such as low output, low precision or high cost.

Photolithography is a method based on photolithography technology, which can be processed on more precise devices, has a detailed preparation process, and has a high yield, but other solvents added during use may affect calcium Titanium quantum dot material causes some damage

3D printing is usually realized by using digital technology material printers, such as direct ink writing technology. Although it can precisely control the alignment of anisotropic fillers in complex 3D architectures, it is still difficult to achieve large-area printing. production

The current processing accuracy can reach 2nm, surpassing the traditional photolithography technology. Although higher processing accuracy can be obtained, there is a possibility of contact pollution to the material during the imprinting process, so the application is relatively limited.

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