Method for forming cantilever beam probe based on femtosecond laser and high temperature and cantilever beam probe

Abstract

The invention belongs to the field of micro-nano manufacturing, and particularly relates to a method for forming a cantilever beam probe based on femtosecond laser and high temperature and the cantilever beam probe. The forming method comprises the following steps: S1, placing the silicon substrate with the micro-nano order of magnitude under a microscope; S2, performing ion etching on the surfaceof the silicon substrate to form a plurality of holes; S3, performing high-temperature forming on the silicon substrate after ion etching to form a cavity in the silicon substrate to obtain a cantilever beam with the cavity inside; and S4, fixing one end of the cantilever beam internally provided with the cavity, adjusting femtosecond laser performance parameters, and forming the probe at the other end of the cantilever beam by using femtosecond laser. The method for manufacturing the cantilever beam probe is simple and effective, the cost required for purchasing expensive test equipment is saved, and the cavity is formed in the cantilever beam, so that the resonant frequency of the cantilever beam probe is improved, and the detection precision of the cantilever beam probe is improved.

Description

technical field [0001] The invention belongs to the field of micro-nano manufacturing, and in particular relates to a method for forming a cantilever beam probe based on femtosecond laser and high temperature and the cantilever beam probe. Background technique [0002] Microcantilever is an extremely precise micromechanical structure, which is widely used in the field of microsensors and atomic force microscopes. Its working principle is to convert extremely small physical signal changes and chemical signal changes into electrical signal changes, which is convenient for accurate calculation and recording in the later stage. Common physical signal changes and chemical signal changes are mainly surface pressure changes, thermal changes, and chemical reaction changes of the cantilever beam. [0003] The micro-cantilever probe is the most important part of the micro-sensor, and it is generally prepared by low-pressure chemical vapor deposition, chemical corrosion, and sputterin...

AI Technical Summary

Problems solved by technology

The above-mentioned technologies have a series of shortcomings such as expensive experimental equipment, extremely complicated manufacturing process and low molding efficiency.

The defects in the existing technology have inhibited the application and development of the micro-cantilever beam in the field of sensors to a certain extent

It can be seen that the production method uses techniques such as chemical etching and sputtering, so expensive test equipment is still required, and the manufacturing process is also extremely complicated.

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