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Polyimide film and preparation method thereof, flexible display panel

A technology of polyimide film and polyimide precursor, which is applied in the field of materials, can solve problems such as difficult to balance mechanical properties, thermal properties and optical properties, and achieve the effect of excellent mechanical properties and optical properties

Active Publication Date: 2022-07-12
WUHAN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Known polyimide film materials on the market are usually difficult to balance mechanical properties, thermal properties, and optical properties

Method used

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  • Polyimide film and preparation method thereof, flexible display panel
  • Polyimide film and preparation method thereof, flexible display panel
  • Polyimide film and preparation method thereof, flexible display panel

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0075] The method for preparing a polyimide film of the present application uses a diamine containing a porphine nickel (II) structure as a raw material to prepare a polyimide film. When porphine nickel (II) is catalytically hydrogenated in a general solvent, porphine nickel (II) is preferentially hydrogenated, but the benzene ring is preferentially hydrogenated in trifluoroacetic acid. In this application, a nitrating agent is introduced into trifluoroacetic acid to synthesize nitrated porphine nickel (II), and then a hydrazine salt is used to prepare a diamine containing porphine nickel (II), and then a halogen-containing dianhydride structure is introduced to generate a polyimide precursor , and the polyimide precursor is cross-linked and cured at high temperature, and finally a polyimide film material with excellent heat resistance, mechanical properties and optical properties is obtained.

[0076] The present application also provides a polyimide film, which can be prepar...

Embodiment 1

[0090] Embodiment 1 includes the following steps:

[0091] 1.1 Preparation of nickel (II) dinitroporphine

[0092] The nickel porphine(II) used in Example 1 is 5,10,15,20-tetramethyl-21H,23H-nickel porphine(II), which can be purchased commercially.

[0093] Under the protection of argon, 0.3-1.1 mol of 5,10,15,20-tetramethyl-21H,23H-porphine nickel(II) was added to the reaction vessel, and then trifluorotrifluorocarbonate with a volume of 12 mL-50 mL was added. The acetic acid solvent is dissolved, stirring is continued, and 0.1-2.5 mol of sodium nitrite that has been completely dissolved in 2-5 mL of solvent is gradually added dropwise to the solution. After reacting at room temperature for 12-30 min, stop stirring, add 100 mL of deionized water to the reaction solution, stir well and let stand, then use dichloromethane for extraction, collect the organic layer, and rotate to obtain the crude product. Subsequent rinsing and rotary evaporation with a mixed solution of dichlo...

Embodiment 2

[0113] Embodiment 2 includes the following steps:

[0114] 2.1 Preparation of nickel (II) dinitroporphine

[0115] The nickel porphine(II) used in Example 2 is 5,10,15,20-tetramethyl-21H,23H-nickel porphine(II), which can be purchased commercially.

[0116] Under the protection of argon, 0.3-1.1 mol of 5,10,15,20-tetramethyl-21H,23H-porphine nickel(II) was added to the reaction vessel, and then trifluorotrifluorocarbonate with a volume of 12 mL-50 mL was added. The acetic acid solvent is dissolved, stirring is continued, and 0.1-2.5 mol of sodium nitrite is completely dissolved by adding 2-5 mL to the solution at one time. After reacting at room temperature for 12-30 min, stop stirring, add 100 mL of deionized water to the reaction solution, stir well and let stand, then use dichloromethane for extraction, collect the organic layer, and rotate to obtain the crude product. Subsequent rinsing and rotary evaporation with a mixed solution of dichloromethane / petroleum ether in a ...

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Abstract

The present application provides a method for producing a polyimide film and a polyimide film produced by the method. The manufacturing method includes the following steps: dissolving porphine nickel (II) in trifluoroacetic acid to undergo a nitration reaction with a nitrating agent to generate dinitroporphine nickel (II); dissolving the dinitroporphine nickel (II) reacting with a hydrazine salt to form nickel diaminoporphine (II); polymerizing the nickel diaminoporphine (II) with a halogen-containing dianhydride to form a polyimide precursor; and polymerizing the polyimide precursor Intramolecular condensation occurs to form a polyimide film.

Description

technical field [0001] The present application relates to the field of materials, in particular to a polyimide film, a preparation method thereof, and a flexible display panel. Background technique [0002] In the field of OLED panels, a commonly used flexible substrate uses polyimide films. The known polyimide film materials on the market are usually difficult to take into account the mechanical properties, thermal properties and optical properties. The mechanical properties of the current polyimide films are evaluated by their tensile properties. As a basic requirement, the maximum breaking stress of a 10 μm polyimide film is 350 MPa and above, the elongation at break is above 15%, and the thermal properties are Thermogravimetry (TGA) evaluation, the temperature of 1% of the mass of the weight loss should be above 560°C, the thermal expansion coefficient should be within 5ppm / K, and the transmittance should be within the range of 380nm to 780nm in terms of optical propert...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C08G73/10C08L79/08C08J5/18H01L27/32G09F9/30
CPCC08J5/18C08G73/1085G09F9/301C08J2379/08H10K59/12Y02P70/50
Inventor 汪亚民陈诚
Owner WUHAN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD