Radical-cationic hybrid photocurable composition and photosensitive resist dry film

A hybrid light curing and free radical technology, applied in photosensitive materials, optics, and optomechanical equipment for optomechanical equipment, etc., can solve the problems of human body damage, ozone pollution environment, serious light intensity attenuation, etc., to overcome imaging problems. The difference, high light sensitivity, small human body damage effect

Pending Publication Date: 2021-01-05
BAODING LUCKY INNOVATIVE MATERIALS +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

From the perspective of safety and operability, these laser light sources are not conducive to the health of operators and cannot be operated in a bright room; from the perspective of cost, the equipment price is relatively high
At the same time, the penetration of ultraviolet light is weak, and some components with conjugated structures or pigment substances in the photocuring formula have strong absorption of ultraviolet light, resulting in serious light intensity attenuation, incomplete curing, and poor performance of photocurable films; easy to generate ozone pollute the environment, etc.
In addition, ultraviolet light is harmful to the human body, the life of the light source is short, and the price is higher

Method used

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  • Radical-cationic hybrid photocurable composition and photosensitive resist dry film
  • Radical-cationic hybrid photocurable composition and photosensitive resist dry film
  • Radical-cationic hybrid photocurable composition and photosensitive resist dry film

Examples

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Embodiment

[0233] The following examples illustrate the present invention in detail, but the present invention is not limited to these examples. In addition, in the following, unless otherwise specified, "part" means a weight part.

[0234] (A) Alkali-soluble polymer

[0235] Synthetic example

preparation example 1

[0236] Preparation Example 1: Polymer A1

[0237] In a 500mL flask equipped with a stirrer, a reflux condenser, a thermometer, a dropping funnel, and a nitrogen inlet tube, add 100g of methyl ethyl ketone as a solvent, then add 30g of polymerizable monomer methacrylic acid, Styrene 30g, butyl methacrylate 40g, under nitrogen atmosphere, slowly add initiator azobisisobutyronitrile 0.8g while stirring, insulate while stirring at 80 ℃ for 10 hours, cool, obtain as (A) The alkali-soluble polymer solution of the components was prepared to have a non-volatile component concentration (solid component concentration) of 50% by weight.

preparation example 2-4

[0238] Preparations 2-4: Polymers A2, A3 and A4

[0239] Alkali-soluble polymers A2, A3, and A4 were obtained in the same manner as in obtaining the alkali-soluble polymer A1, except that the weight ratios shown in Table 1 were used as polymerizable monomers.

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Abstract

The present invention relates to a radical-cationic hybrid photocurable composition. The composition comprises (a) at least one alkali-soluble polymer, (b) at least one photopolymerizable compound, (c) at least one infrared absorbing photosensitizer, and (d) at least one photopolymerization initiator, the photopolymerizable compound as component (b) contains (b1) at least one radically polymerizable compound and (b2) at least one cationically polymerizable compound selected from the group consisting of alkenyl ether compounds and/or ethylene oxide compounds and/or aziridine compounds and/or oxetane compounds; the infrared absorbing photosensitizer as component (c) comprises at least one polymethine cyanine compound. The composition is advantaged in that the radical cation hybrid photocurable composition of the present invention is suitable for preparing a photosensitive resist dry film.

Description

technical field [0001] The present invention relates to a radical-cation hybrid photocurable composition comprising (a) at least one alkali-soluble polymer, (b) at least one photopolymerizable compound, (c) at least one infrared absorbing photosensitizer and (d) at least one photopolymerization initiator. The free radical-cation hybrid photocurable composition of the present invention is suitable for preparing photosensitive resist dry film. Background technique [0002] Since the advent of printed circuit boards (PCBs), the research and development of materials used for PCB pattern transfer has never stopped. In the PCB manufacturing process, graphic transfer is a key process. In 1968, DuPont of the United States introduced the application of photosensitive resist dry film for PCB graphic transfer, and it has played a leading role in PCB graphic transfer since then. With the continuous advancement of science and technology, driven by the miniaturization of electronic equi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/004G03F7/027
CPCG03F7/004G03F7/027
Inventor 邹应全庞玉莲辛阳阳丁艳花B·斯特雷梅尔
Owner BAODING LUCKY INNOVATIVE MATERIALS
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