A circuit board and its method and application for preventing circuit oxidation
A circuit board and circuit technology, applied in the direction of printed circuit, printed circuit manufacturing, electrical components, etc., can solve the problems of increased haze of circuit boards, affecting service life, affecting coating protection performance, etc., to meet low resistance or low impedance Requirements, ensuring stability and reliability, and improving the effect of oxidation resistance
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Embodiment 1
[0087] (1) The glass plate is used as the carrier of the circuit board, and the glass plate is sprayed and cleaned with a weak alkali cleaning solution (pH 7.1), washed with a rolling brush, rinsed with high-purity water, air-dried and dried, and set aside.
[0088] (2) The first metal film layer made of copper-nickel alloy (50% by mass of copper) is sputtered by a magnetron sputtering process on one surface of the glass plate, the thickness is 10nm, and the process conditions are: sputtering The total power of the radio source is 2kW, the argon gas pressure is 0.6Pa, and the temperature of the circuit board carrier is 150°C.
[0089] (3) The second copper film layer made of copper is electroplated by an acidic electroplating process on the surface of the first metal film layer, the thickness is 25 μm, and the process conditions are: CuSO 4 Concentration is 75g / L, H 2 SO 4 Concentration is 240g / L, chloride ion (Cl - ) concentration is 50ppm, and the temperature is 30°C.
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Embodiment 2
[0095] (1) The glass plate is used as the carrier of the circuit board, and the glass plate is sprayed and cleaned with a weak alkali cleaning solution (pH 7.1), washed with a rolling brush, rinsed with high-purity water, air-dried and dried, and set aside.
[0096] (2) The first metal film layer made of copper-nickel alloy (50% by mass of copper) is sputtered by a magnetron sputtering process on one surface of the glass plate, the thickness is 100nm, and the process conditions are: sputtering The total power of the radio source is 2kW, the argon gas pressure is 0.6Pa, and the temperature of the circuit board carrier is 150°C.
[0097] (3) The second copper film layer made of copper is electroplated by an acidic electroplating process on the surface of the first metal film layer, the thickness is 50 μm, and the process conditions are: CuSO 4 Concentration is 75g / L, H 2 SO 4 Concentration is 240g / L, chloride ion (Cl - ) concentration is 50ppm, and the temperature is 30°C.
...
Embodiment 3
[0102] (1) The glass plate is used as the carrier of the circuit board, and the glass plate is sprayed and cleaned with a weak alkali cleaning solution (pH 7.1), washed with a rolling brush, rinsed with high-purity water, air-dried and dried, and set aside.
[0103] (2) The first metal film layer made of copper-nickel alloy (50% by mass of copper) is sputtered by a magnetron sputtering process on one surface of the glass plate, the thickness is 200nm, and the process conditions are: sputtering The total power of the radio source is 2kW, the argon gas pressure is 0.6Pa, and the temperature of the circuit board carrier is 150°C.
[0104] (3) The second copper film layer made of copper is electroplated by an acidic electroplating process on the surface of the first metal film layer, the thickness is 100 μm, and the process conditions are: CuSO 4 Concentration is 75g / L, H 2 SO 4 Concentration is 240g / L, chloride ion (Cl - ) concentration is 50ppm, and the temperature is 30°C. ...
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