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Device and process for producing high-purity trichlorosilane and silicon tetrachloride

A technology of silicon tetrachloride and trichlorosilane, which is applied in the chemical industry, silicon compounds, silicon halide compounds, etc., can solve the problems of affecting the operation cycle of the device, short operation cycle, and post-system blockage, so as to ensure long-term stable operation , Eliminate micro-silica fume clogging, and realize the effect of waste heat recovery

Inactive Publication Date: 2021-01-12
郑州格矽科技发展有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] Current situation of domestic trichlorosilane and silicon tetrachloride devices: HCL cannot be 100% completely reacted during the synthesis reaction, and post-system treatment is required; the synthesis reaction cannot realize automatic slag discharge, and the operation cycle is short, which cannot guarantee the long-term operation of the entire device; There is no dry dust removal system for synthetic silane gas, and a large amount of microsilica powder enters the rear system, causing blockage of the rear system and affecting the operating cycle of the device; the separation of silane gas has not reached the separation of high-purity and ordinary products; it is impossible to control trichlorosilane and Silicon tetrachloride output ratio

Method used

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  • Device and process for producing high-purity trichlorosilane and silicon tetrachloride
  • Device and process for producing high-purity trichlorosilane and silicon tetrachloride
  • Device and process for producing high-purity trichlorosilane and silicon tetrachloride

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Effect test

Embodiment 1

[0035] Such as image 3 As shown, the synthesis unit of trichlorosilane and silicon tetrachloride in the present embodiment comprises a silicon powder silo 1, a silicon powder weighing hopper 2, a silicon powder feeding bin 3 and a synthesis furnace 4 connected in sequence, and the silicon powder The feeding bin 3 is also connected with a waste powder tank 5, which processes the waste silicon powder. HCl is also added to the synthesis furnace 4 to react with the silicon powder as a reactant to produce trichlorosilane and silicon tetrachloride. .

[0036] The top of the synthesis furnace 4 is also connected with the heat transfer oil heater 7 through the heat conduction oil circulation pump 6, and the heat transfer oil heater 7 is also connected with a reboil boiler 8, and the reboil boiler 8 is also connected with the synthesis furnace 4 connections. The reaction carried out in the synthesis furnace 4 of trichlorosilane and silicon tetrachloride belongs to exothermic reaction,...

Embodiment 2

[0038] Such as image 3 As shown, the purification unit of trichlorosilane and silicon tetrachloride in this embodiment includes a first dry dust collector 9A, a second dry dust collector 9B, a water-cooled washing tower 10 and a cryogenic condensation tower 11 connected in sequence. The water-cooled washing tower 10 and the cryogenic condensing tower 11 are respectively connected with the chlorosilane buffer tank 12. The trichlorosilane, silicon tetrachloride, and hydrogen generated after the synthesis furnace 4 react pass through the first dry dust collector 9A and the second dry dust collector 9B to remove unreacted silicon powder, and then pass through the water-cooled scrubber 10, deep-cooled The condensing tower 11 obtains chlorosilane liquid. The condensed chlorosilane liquid enters the chlorosilane buffer tank 12, and the water-cooled washing tower circulation pump 13 transports the washing materials to the water-cooled washing tower 10 after being cooled by the air c...

Embodiment 3

[0042] Such as Figure 4 As shown, the separation unit of trichlorosilane and silicon tetrachloride in this embodiment includes a distillation column 15, a distillation condenser 17, a first buffer tank 18, a circulation pump 19, trichlorosilane and silicon tetrachloride connected in sequence Separation tower 20. The top of the trichlorosilane and silicon tetrachloride separation tower 20 is connected with a trichlorosilane first condenser 22 , a second buffer tank 23 , and a trichlorosilane circulating pump 24 in sequence. The mixed solution of trichlorosilane and silicon tetrachloride from the chlorosilane buffer tank 12 enters the distillation tower 15 under the action of the system pressure, and the high boilers discharged from the bottom of the tower are sent to the high-waste treatment device through the circulation pump 16 at the bottom of the distillation tower. deal with. Trichlorosilane circulating pump 24 outputs trichlorosilane, and the purity of trichlorosilane ...

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Abstract

The invention relates to a device and a process for producing high-purity trichlorosilane and silicon tetrachloride. The device comprises a trichlorosilane and silicon tetrachloride synthesis unit, atrichlorosilane and silicon tetrachloride purification unit and a trichlorosilane and silicon tetrachloride separation unit which are connected in sequence, and a trichlorosilane refining unit and a silicon tetrachloride refining unit are respectively connected with the trichlorosilane and silicon tetrachloride separation unit. By adopting the device provided by the invention, HCl completely reacts in the synthesis process, a hydrogen chloride recovery device and a byproduct hydrogen water washing treatment device of a later system are not needed, direct recycling of hydrogen after cryogenic treatment is realized, online production is realized, unreacted silica fume of the system can be discharged without stopping the device, long-term stable operation of the device is ensured, and waste heat recovery of the device can be ralized. The dry dust remover is added in the device so that the dry dust removal of the trichlorosilane device is realized, the silica fume is prevented from entering a subsequent washing tower device, the blockage of the subsequent system due to the silica fume is eliminated, and the long-term stable operation of the device is ensured.

Description

technical field [0001] The invention belongs to the technical field of electronic-grade silane gas, and in particular relates to a device and a process for producing high-purity trichlorosilane and silicon tetrachloride. Background technique [0002] Today, with the rapid development of mobile communication technology, people pay more and more attention to the mobile communication technology industry, which greatly promotes the development of the mobile communication technology industry to a certain extent, and semiconductor chips and optical fiber preforms play an important role in the development of the mobile communication technology industry. Playing an important role, high-purity trichlorosilane and high-purity silicon tetrachloride are the basic materials for the semiconductor chip and optical fiber preform industry, and are the basic materials for the production of semiconductor chips and optical fiber preform components. In recent years, domestic semiconductor silico...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B33/107
CPCC01B33/10752C01B33/10763C01B33/10778Y02P20/10Y02P20/129
Inventor 高明东李正宾刘旭瑞孙春凤
Owner 郑州格矽科技发展有限公司
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