Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

High-low-temperature-resistant low-infrared-emissivity coating and preparation method thereof

A technology with low infrared emission and high and low temperature resistance, applied in the direction of epoxy resin coating, coating, etc., can solve the problem that high temperature resistance performance is only applicable, and achieve the effect of good construction and excellent protection function

Inactive Publication Date: 2021-01-26
天津灯塔涂料工业发展有限公司
View PDF4 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The current low-infrared emission coating is organic fluorine polyurethane type, and its high temperature resistance is only suitable for ambient temperatures below 200 °C

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • High-low-temperature-resistant low-infrared-emissivity coating and preparation method thereof
  • High-low-temperature-resistant low-infrared-emissivity coating and preparation method thereof
  • High-low-temperature-resistant low-infrared-emissivity coating and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0030] A coating with high and low temperature resistance and low infrared emissivity, prepared by the following method:

[0031] ① Preparation of special diluent:

[0032] Stir and mix butyl acetate, n-butanol, and propylene glycol methyl ether acetate according to a weight ratio of 60:25:10.

[0033] ② Preparation of coating component A:

[0034] ②-1. Accurately weigh 50kg of epoxy resin 618, add it to the dispersing equipment with a mixer, add 22kg of special diluent that has been prepared, start stirring at a medium speed of 600-800 rpm, and stir the resin liquid evenly. It takes about 8 minutes or so.

[0035] ②-2. Accurately weigh 3kg of dispersant (BYK161), 0.1kg of leveling agent (BYK310), and 2kg of adhesion promoter (6210), and add them to the dispersing equipment and stir evenly. It takes about 12 minutes.

[0036] ②-3. Reduce the stirring speed to 400 rpm, slowly add 46 kg of accurately weighed flake aluminum powder slurry (STAPA15), and stir for about 18 minute...

Embodiment 2～5

[0040] The formula is shown in Table 2 below, and the manufacturing method is the same as in Example 1.

[0041] Table 2

[0042]

[0043]

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a high-low-temperature-resistant low-infrared-emissivity coating and a preparation method thereof. The coating is composed of a component A and a component B according to a weight ratio of 100: 46-47, and the component A is composed of the following components, by weight: 50-60 parts of low-molecular-weight liquid epoxy resin with the solid content greater than 98%, 46-56 parts of non-floating flaky metal aluminum powder, 4.5-5 parts of a dispersing agent, 0.1-2 parts of a leveling agent, 2.5-4 parts of an adhesion promoter and 19-24.5 parts of a special diluent. The component B is high-silicon-content liquid polyamino siloxane resin of which the solid content is greater than 90%; and the coating is a three-proofing (waterproof, salt mist-proof and damp-heat-proof) coating which can resist high and low temperatures and has an excellent infrared masking function within the temperature range of 25-400 DEG C.

Description

technical field [0001] The invention relates to the technical field of new polymer materials, in particular to a coating with high and low temperature resistance and low infrared emissivity and a preparation method thereof. Background technique [0002] The current high-temperature-resistant silicone coating adopts the technical route of curing silicone-modified epoxy resin with polyamide resin. Due to the low silicon content and low cross-linking density, the coating cracks, bubbles, and even falls off after long-term heat resistance. protection of metal substrates. The currently used low-infrared emission coating is organic fluorine polyurethane type, and its high temperature resistance is only suitable for ambient temperatures below 200 °C. In order to meet the market demand, it is urgent to develop a coating that can withstand high temperature to 500°C and low temperature to -55°C, and can still maintain good infrared shielding performance at high temperature. Not only...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C09D163/00C09D7/61C09D7/20
CPCC08K2003/0812C08K2201/011C09D163/00C09D7/20C09D7/61C09D7/70C08K7/00C08K3/08
Inventor 黄震高萌何效凯孙瑞翟菁赵蕊
Owner 天津灯塔涂料工业发展有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com