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Titanium substrate with metal nanoparticles growing on surface in situ and application of titanium substrate

A technology of in-situ growth of metal nanoparticles, applied in nanotechnology, nanotechnology, nanotechnology, etc. for materials and surface science, can solve the problem of uneven distribution of metal nanoparticles, inability to use in large quantities, and easy shedding of nanoparticles and other problems, to achieve the effect of mass production, simple and rapid preparation operation, and good chemical stability

Active Publication Date: 2021-03-12
JIANGNAN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] Aiming at the problems that the surface of the enhanced Raman substrate prepared by the traditional method will have varying degrees of uneven distribution of metal nanoparticles, the nanoparticles are easy to fall off, the preparation process is cumbersome, and it cannot be used in large quantities. The present invention provides a method using in-situ chemical deposition The method, through a one-pot reduction reaction in the solution phase, directly obtains metal nanoparticles / titanium surface-enhanced Raman substrates, which improves the four major disadvantages of the above-mentioned traditional methods.

Method used

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  • Titanium substrate with metal nanoparticles growing on surface in situ and application of titanium substrate
  • Titanium substrate with metal nanoparticles growing on surface in situ and application of titanium substrate
  • Titanium substrate with metal nanoparticles growing on surface in situ and application of titanium substrate

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Embodiment 4

[0045]In Example 4, the theoretical calculation and simulation of picric acid solution adopts Gaussion03 software.

Embodiment 1

[0047] Alkaline degreasing: configure NaOH (4wt%), Na 2 CO 3 (2wt%) solution of 100 mL of solution, a batch of 1 cm × 3 cm × 0.5 cm titanium substrates were immersed in the solution, and sonicated at 53 kHz, 250 W for 30 min.

[0048] Oxalic acid etching: Rinse the titanium plate after degreasing with clean water, immerse it in a 20wt% oxalic acid solution, control the temperature of the solution to 98°C, and remove it after etching for 5 hours for cleaning.

[0049] Chemical growth of copper nanospheres: Immerse the pretreated titanium plate in the prepared chemical deposition solution, including ammonium fluoride (8g / L), copper sulfate pentahydrate (20g / L), citric acid (20g / L) ), sulfuric acid (0.8 vol%), deposited at 20° C. for 3 minutes, taken out, cleaned, and blown dry with nitrogen to prepare a titanium-based enhanced Raman substrate supported by copper nanospheres.

[0050] figure 1 This is a cold-field scanning electron microscope photograph of the prepared copper ...

Embodiment 2

[0053] Alkaline degreasing: prepare a 100 mL solution of NaOH (10wt%) solution, immerse a batch of 1cm×1cm×0.5cm titanium substrates in the solution, and sonicate at 53kHz and 250W for 1 hour.

[0054] Oxalic acid etching: Rinse the titanium plate after degreasing with clean water, immerse it in an oxalic acid (15wt%) solution, control the temperature of the solution to 98°C, and etch it for 3 hours, take it out and clean it for later use.

[0055] Chemical growth of gold nanoflowers: Immerse the pretreated titanium plate in the prepared chemical deposition solution, including ammonium fluoride (10g / L), chloroauric acid (1g / L), citric acid (20g / L) , hydrochloric acid (0.4 vol%), deposited in a solution at 20° C. for 2 minutes, taken out, cleaned, and blown dry with nitrogen to prepare a titanium-based enhanced Raman substrate supported by gold nanoflowers.

[0056] image 3 This is a cold-field scanning electron microscope photograph of the prepared gold nanoflower-loaded tit...

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Abstract

The invention discloses a titanium substrate with metal nanoparticles growing on the surface in situ and application of the titanium substrate, and belongs to the field of the enhanced Raman substratepreparation technology and detection. A pretreated titanium substrate is immersed in a chemical deposition solution, deposition is conducted for 30 s to 2 h at the temperature of 0 DEG C to 60 DEG C,the pretreated titanium substrate is cleaned and dried after being taken out, and the titanium substrate with the metal nanoparticles growing on the surface in situ can be obtained, wherein the chemical deposition solution comprises 5 g / L-40 g / L of ammonium fluoride, 1 g / L-50 g / L of metal salt, 5 g / L-30 g / L of citric acid and 0.1 vol%-1 vol% of strong acid. By regulating and controlling the etching rate of particles on the surface of the titanium substrate and the diffusion rate of trivalent titanium ions, a metal particle reduction reaction occurs in the solution near the surface of the substrate, and therefore metal elements are loaded on the surface of the titanium substrate in the form of nanoparticles, a nanoparticle layer which is more uniform and compact and free of dead corners grows on the surface of the titanium substrate, and the surface enhanced Raman effect is greatly improved.

Description

technical field [0001] The invention relates to a titanium substrate with in-situ growth of metal nanoparticles on the surface and its application, and belongs to the field of enhanced Raman substrate preparation technology and detection. Background technique [0002] Since the discovery of surface-enhanced Raman scattering in 1974, Raman detection has gradually become one of the most attractive analytical tools in the field of ultrasensitive detection. Surface-enhanced Raman technology is also considered to be one of the most promising research directions in small molecule detection. By using surface-enhanced Raman imaging technology, multi-target analysis and biological image signals with higher spatial resolution can also be obtained, enabling visualization of regions with different dopant material distributions. Label-free detection can also be achieved when analyzing various biological samples. With the introduction of electromagnetic field theory into the study of su...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C18/40C23C18/44G01N21/65B82Y30/00B82Y40/00
CPCB82Y30/00B82Y40/00C23C18/40C23C18/44G01N21/658
Inventor 宋启军孙国巍王婵付程方御
Owner JIANGNAN UNIV
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