Preparation method of surface-enhanced Raman scattering substrate
A surface-enhanced Raman and substrate technology, which is applied in Raman scattering, the process for producing decorative surface effects, and the manufacture of microstructure devices, etc. The low probability of hot spot coincidence and the high cost of large-area substrates can achieve the effect of uniform nanostructure and SERS signal, maintaining long-term enhancement ability, and improving overall enhancement ability
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[0043] see figure 1 , a method for preparing a surface-enhanced Raman scattering substrate according to an embodiment of the present invention, comprising the following steps:
[0044] Step 1, in 4 inches of SiO 2 / Si(001) substrate to prepare two-dimensional colloidal crystals with densely packed single-layer nanospheres, and obtain two-dimensional colloidal crystals-SiO 2 / Si(001) substrate sample; SiO 2 The / Si(001) substrate includes a Si layer 4, and SiO disposed on its surface 2 Layer 3.
[0045] Step 2, using plasma etching to reduce the diameter of the nanosphere 2 to obtain the etched two-dimensional colloidal crystal-SiO 2 / Si(001) substrate sample;
[0046] Step 3, use the etched microspheres of the sample in step 2 as a mask, deposit a layer of metal film 5 on the substrate as a mask, and obtain the etched two-dimensional colloidal crystal-metal film mask-SiO 2 / Si(001) substrate sample;
[0047] Step 4, peel off the microsphere 2D colloidal crystal layer in...
Embodiment 1
[0069] A method for preparing a surface-enhanced Raman scattering substrate according to an embodiment of the present invention includes the following steps:
[0070] Step 1, using the Langmuir-Blodgett method on 50nm SiO 2 / Si(001) substrate to prepare a large area of two-dimensional colloidal crystals of close-packed monolayer 500nm polystyrene (PS) microspheres, and obtain two-dimensional colloidal crystals of PS microspheres-SiO 2 / Si substrate sample; wherein the surface of the Si substrate was pre-hydrophilized.
[0071] Step 2, use O 2 As a reaction gas, the diameter of PS microspheres was reduced to 250nm by ICP etching method, and the etched PS microspheres two-dimensional colloidal crystal-SiO 2 / Si substrate samples.
[0072] Step 3, use the etched PS microspheres of the sample in step 2 as a mask, and deposit a layer of Cr on the substrate as a mask by using an electron beam evaporation method to obtain a two-dimensional colloidal crystal-Cr mask of PS microsp...
Embodiment 2
[0083] A method for preparing a surface-enhanced Raman scattering substrate according to an embodiment of the present invention includes the following steps:
[0084] Step 1, using the spin-coating method on 10nm SiO 2 Two-dimensional colloidal crystals of large-area close-packed monolayer 1 μm polymethyl methacrylate (PMMA) microspheres were prepared on Si(001) substrates to obtain two-dimensional colloidal crystals of PMMA microspheres-SiO 2 / Si substrate sample; wherein the surface of the Si substrate was pre-hydrophilized.
[0085] Step 2, use O 2 As a reaction gas, the diameter of PS microspheres was reduced to 800nm by RIE etching method, and the two-dimensional colloidal crystals of PMMA microspheres after etching were obtained-SiO 2 / Si substrate samples.
[0086] Step 3, use the PMMA microspheres after the sample etching in step 2 as a mask, and use an electron beam evaporation method to deposit a layer of Ni on the substrate as a mask to obtain a PMMA microspher...
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