Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

High-performance coating for metal film resistor and preparation method of coating

A metal film resistor, high-performance technology, used in epoxy resin coatings, coatings, etc., can solve the problems of less research on water absorption of coatings and high water absorption of coatings, and achieve high thermal conductivity, strong surface area, and improved power. Effect

Inactive Publication Date: 2021-03-16
CHINA ELECTRIC POWER RES INST +1
View PDF7 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] At present, domestic research work on coatings for metal film resistors is mainly focused on improving the performance of high temperature resistance and high humidity resistance, while there are few studies on the water absorption of coatings, and the coatings prepared by the existing technology have generally high water absorption.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • High-performance coating for metal film resistor and preparation method of coating
  • High-performance coating for metal film resistor and preparation method of coating
  • High-performance coating for metal film resistor and preparation method of coating

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0032] S1. At room temperature, 3g of nano-alumina is uniformly dispersed in 37g of absolute ethanol solution and ultrasonically oscillated, and 40g of o-cresol type novolac epoxy resin is added, stirred and mixed to obtain novolak epoxy resin-nano-alumina solution;

[0033] S2. Add 20 g of hydroxyl-terminated polydimethylsiloxane to the novolak epoxy resin-nano-alumina solution, mix and add 1 mass part of γ-aminopropyltriethoxysilane and stir evenly, then add 28g of methyl hexahydrophthalic anhydride curing agent was mixed and stirred evenly to prepare sample 1 of high-performance coating for metal film resistors.

Embodiment 2

[0035] S1. At room temperature, 4g of nano-alumina is uniformly dispersed in 60g of absolute ethanol solution and ultrasonically oscillated, and 50g of o-cresol type novolac epoxy resin is added, stirred and mixed to obtain novolak epoxy resin-nano-alumina solution;

[0036] S2. Add 30 g of hydroxyl-terminated polydimethylsiloxane to the novolak epoxy resin-nano-alumina solution, mix and add 3 parts by mass of γ-aminopropyltriethoxysilane and stir evenly, then add 30g of methyltetrahydrophthalic anhydride curing agent was mixed and stirred uniformly to prepare high-performance coating sample 2 for metal film resistors.

Embodiment 3

[0038] S1. Disperse 2g of nano-alumina evenly in 35g of absolute ethanol solution at room temperature and use ultrasonic vibration, add 30g of bisphenol A novolac epoxy resin, stir and mix to obtain novolak epoxy resin-nano-alumina solution;

[0039] S2. Add 25g of hydroxyl-terminated polymethylphenylsiloxane to the novolak epoxy resin-nano-alumina solution, mix and add 1.5 parts by mass of γ-glycidyl etheroxypropyltrimethoxysilane and stir evenly , and then add 25g of methyl hexahydrophthalic anhydride curing agent and mix and stir evenly to prepare high-performance coating sample 3 for metal film resistors.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to an electronic information material technology, in particular to a high-performance coating for a metal film resistor and a preparation method of the high-performance coating.The high-performance coating for the metal film resistor is composed of the following raw materials: organic silicon resin, novolac epoxy resin, an anhydride curing agent, a silane coupling agent, nano aluminum oxide and absolute ethyl alcohol. The coating for the metal film resistor has the characteristics of good film-forming property, good adhesive force, low water absorption, high-temperatureresistance and good high humidity resistance, the surface of a formed film is smooth, compact and free of pores, and the preparation method of the coating for the metal film resistor is relatively lowin cost, easily available in raw materials, simple in process and good in application prospect.

Description

technical field [0001] The invention relates to electronic information material technology, in particular to a high-performance coating for metal film resistors and a preparation method thereof. Specifically, it is a silicone resin / phenolic epoxy resin coating with low water absorption, high temperature resistance and high humidity resistance for metal resistors. Background technique [0002] Metal film resistors are the most widely used resistors so far, with high precision, stable performance, simple and light structure. It plays a non-negligible role in the electronics industry and military aerospace under high precision requirements. Compared with carbon film resistors, this kind of resistor has small size, low noise, and good stability, but its cost is high. It is often widely used as a precision and high-stability resistor, and it is also commonly used in various radio electronic devices. However, the natural environmental conditions of its work are generally relativ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C09D163/04C09D163/02C09D183/04C09D7/61C09D7/63
CPCC08K2003/2227C08K2201/005C08K2201/011C08L2201/08C09D163/00C09D163/04C09D7/61C09D7/63C08L83/04C08K5/544C08K3/22C08K5/5435
Inventor 李登云岳长喜赵玉顺龚超朱凯余佶成张松张子扬李鹤李智成刘洋冯阳熊魁梁思远
Owner CHINA ELECTRIC POWER RES INST
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products