Preparation method of vanadium diselenide nanosheet spontaneously separated from growth substrate
A technology of vanadium diselenide and growth substrate, applied in the field of preparation of vanadium diselenide nanosheets, can solve the problems of time-consuming growth and transfer of vanadium diselenide, pollute the environment and samples, etc. The effect of crystal quality
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[0030] A method for preparing vanadium diselenide nanosheets spontaneously separated from a growth substrate, comprising:
[0031] Step 1: Substrate cutting
[0032] The polished silicon substrate on one side was carved into a rectangle of 1.5 cm×1 cm with a diamond burr.
[0033] Step 2: Substrate Cleaning
[0034] (1) Put the polished side of the silicon substrate 6 upwards into a beaker containing acetone, ethanol and deionized water for cleaning. The liquid level of the cleaning solution should be 1 cm above the silicon substrate, and then put the beaker into the ultrasonic cleaning Ultrasound in the device for 20min;
[0035] (2) Dry the cleaned silicon substrate 6 with a nitrogen gun.
[0036] Step 3: Weighing the mass of precursor selenium
[0037] (1) Put a 3cm-long silicon dioxide substrate 1 into a balance and peel it off, put selenium powder 2 with a purity of 99.99% on the silicon dioxide substrate 1 with a medicine spoon, and weigh 200 mg with an electronic ba...
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