Method for generating anti-corrosion coating on inner wall of gas transmission pipeline by adopting ALD technology
An anti-corrosion coating, gas pipeline technology, applied in the direction of coating, metal material coating process, gaseous chemical plating, etc., can solve the problems of reducing production efficiency, corroding gas pipelines, uniform film formation, etc. The effect of mass production, uniform film thickness and dense coating
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Embodiment 1
[0032] Such as figure 1 As shown, it is an existing plasma etching equipment, which includes: a reaction chamber 1, a gas shower head 3, a gas through hole 2 for introducing a possibly corrosive reaction gas, and a plurality of gas pipelines 4. Air source 5 and multiple electronic switch valves 6. The gas source 5 feeds corrosive reaction gas into the reaction chamber 1 through the gas pipeline 4 .
[0033] Before the plasma etching equipment is assembled, the gas pipeline 4 is placed in the reaction chamber of the atomic layer deposition reactor, and an aluminum oxide film is deposited on the inner wall of the gas pipeline 4 as an anti-corrosion coating. The gas pipeline 4 has an inner diameter of 2-4mm and a length of 1m.
[0034] Using ultrapure water as the oxygen source, trimethylaluminum as the aluminum source, N 2 Flush gas. Specific steps are as follows:
[0035] Step 1, the gas pipeline 4 is placed in the reaction chamber of the atomic layer deposition reactor, a...
Embodiment 2
[0043] Such as figure 2As mentioned above, it is an existing gas pipeline 7 made of metal, which includes two air inlets 8 and a gas outlet 9 . The gas pipeline 7 is used in conjunction with plasma etching equipment. The plasma etching equipment includes a reaction chamber (chamber) and a gas shower head. The gas pipeline 7 introduces the reaction gas used for plasma etching into the reaction chamber through the gas shower head, and then applies radio frequency to the reaction chamber. The power is applied to the reactive gas to generate plasma, and the plasma treatment process is performed on the semiconductor workpiece to be processed placed in the reaction chamber.
[0044] Plasma etching equipment is used to etch semiconductor materials, usually chemical active substances containing chlorine, fluorine, etc. are used. These corrosive gases will corrode the gas pipeline 7 through the gas pipeline 7, thereby causing pollution. In this embodiment, an aluminum oxide film is...
Embodiment 3
[0053] SEM-EDS was used to observe the morphology and energy spectrum of the aluminum oxide film deposited on the inner wall of some metal gas pipeline samples. The gas pipeline samples are made of stainless steel. The instrument is a field emission scanning electron microscope (TESCAN MIRA), and an energy dispersive spectrometer (EDS) is used to analyze the type and content of the sample components.
[0054] Cross-section the gas pipeline along its long axis, the result is as follows Figure 3a As shown, the aluminum oxide film as an anti-corrosion coating has completely covered the inner wall of the pipe. Figure 3b to Figure 3e It is a micrograph of the inner wall of the pipeline under different magnifications. After the aluminum oxide film is formed by ALD technology, the inner wall of the pipeline is uniform in thickness and the coating is dense.
[0055] Such as Figure 4 As shown, the main components of the anti-corrosion coating on the inner wall of the gas pipeline...
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