High-thermal-conductivity silicon carbide material and preparation method thereof
A technology of silicon carbide and high thermal conductivity, which is applied in the field of mechanical seal materials, can solve the problems of difficult-to-sinter dense materials and low high-temperature diffusion coefficients, and achieve the effects of promoting sintering, improving thermal conductivity, and increasing fracture toughness
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Embodiment 1
[0040] A method for preparing a silicon carbide material with high thermal conductivity, comprising the following preparation steps:
[0041] S1, take each raw material by weight, including: silicon carbide 700g, diamond 80g, graphite powder 20g, water-soluble phenolic resin 100g, gelatin 20g, boron powder 15g and 75g silicon chip;
[0042] S2, putting each raw material in S1 into a ball mill, and adding 1500g of water to mix evenly to obtain a slurry;
[0043] S3, granulating the slurry in S2 through a spray drying process to obtain pellets;
[0044] S4, using a cold press, compressing the pellets in S3 under a pressure condition of 150MPa to obtain a green body;
[0045] S5. Bake and shape the green body in S4, place a silicon wafer above the green body during baking, and then process it;
[0046] S6. Vacuum sintering is carried out at a temperature of 1600° C., the heating rate is 4° C. / min, the holding time is 3 hours, and a silicon carbide material with high thermal con...
Embodiment 2-5
[0048] The preparation method of the high thermal conductivity silicon carbide material in Examples 2-5 is the same as that of Example 1, the only difference is that the raw material composition and dosage of the high thermal conductivity silicon carbide material are different, as shown in Table 1 and Table 2:
[0049] Table 1 Raw material composition and dosage of high thermal conductivity silicon carbide material in Examples 1-5
[0050]
[0051] Table 2 Parameters of the preparation method of high thermal conductivity silicon carbide material in Examples 1-5
[0052]
Embodiment 6
[0054] The preparation method of the high thermal conductivity silicon carbide material in this example is the same as that in Example 1, the only difference is that in S3, no silicon wafer is placed above the green body during baking and molding.
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